Inventor · disambiguated record
Michel Cote
Also filed as: COTE MICHEL · COTE MICHEL L · COTE MICHEL LUC
23 granted patents·1 pending application·1,533 citations·filing 2001–2009
97Inventor score
Top patents by PatentIndex Score
24 records- 0199US7028285B2Standard cell design incorporating phase informationSYNOPSYS INC·Filed 2002·Granted Apr 11, 2006·262 cites·31 claims
- 0299US6978436B2Design data format and hierarchy management for phase processingSYNOPSYS INC·Filed 2002·Granted Dec 20, 2005·207 cites·6 claims
- 0398US7312003B2Design and layout of phase shifting photolithographic masksSYNOPSYS INC·Filed 2004·Granted Dec 25, 2007·116 cites·5 claims
- 0498US6787271B2Design and layout of phase shifting photolithographic masksNUMERICAL TECH INC·Filed 2002·Granted Sep 7, 2004·84 cites·27 claims
- 0597US6807663B2Accelerated layout processing using OPC pre-processingNUMERICAL TECH INC·Filed 2002·Granted Oct 19, 2004·230 cites·26 claims
- 0697US6745372B2Method and apparatus for facilitating process-compliant layout optimizationNUMERICAL TECH INC·Filed 2002·Granted Jun 1, 2004·243 cites·32 claims
- 0794US7458045B2Silicon tolerance specification using shapes as design intent markersSYNOPSYS INC·Filed 2004·Granted Nov 25, 2008·201 cites·35 claims
- 0894US6721938B2Optical proximity correction for phase shifting photolithographic masksNUMERICAL TECH INC·Filed 2002·Granted Apr 13, 2004·62 cites·53 claims
- 0990US7500217B2Handling of flat data for phase processing including growing shapes within bins to identify clustersSYNOPSYS INC·Filed 2005·Granted Mar 3, 2009·9 cites·28 claims
- 1087US6681379B2Phase shifting design and layout for static random access memoryNUMERICAL TECH INC·Filed 2001·Granted Jan 20, 2004·29 cites·24 claims
- 1185US7348108B2Design and layout of phase shifting photolithographic masksSYNOPSYS INC·Filed 2004·Granted Mar 25, 2008·14 cites·10 claims
- 1282US7629109B2Exposure control for phase shifting photolithographic masksSYNOPSYS INC·Filed 2008·Granted Dec 8, 2009·4 cites·30 claims
- 1382US6861204B2Design and layout of phase shifting photolithographic masksSYNOPSYS INC·Filed 2004·Granted Mar 1, 2005·12 cites·16 claims
- 1482US6852471B2Exposure control for phase shifting photolithographic masksNUMERICAL TECH INC·Filed 2001·Granted Feb 8, 2005·15 cites·11 claims
- 1581US7435513B2Design and layout of phase shifting photolithographic masksSYNOPSYS INC·Filed 2004·Granted Oct 14, 2008·11 cites·8 claims
- 1680US7083879B2Phase conflict resolution for photolithographic masksSYNOPSYS INC·Filed 2001·Granted Aug 1, 2006·15 cites·48 claims
- 1776US7739649B2Design and layout of phase shifting photolithographic masksSYNOPSYS INC·Filed 2007·Granted Jun 15, 2010·2 cites·8 claims
- 1864US6981240B2Cutting patterns for full phase shifting masksSYNOPSYS INC·Filed 2003·Granted Dec 27, 2005·9 cites·22 claims
- 1962US7169515B2Phase conflict resolution for photolithographic masksSYNOPSYS INC·Filed 2004·Granted Jan 30, 2007·5 cites·22 claims
- 2060US2010040965A1Exposure control for phase shifting photolithographic masksSYNOPSYS INC·Filed 2009·Application pending·0 cites
- 2158US8566757B2Layout of phase shifting photolithographic masks with refined shifter shapesCOTE MICHEL L·Filed 2009·Granted Oct 22, 2013·0 cites·3 claims
- 2255US8977989B2Handling of flat data for phase processing including growing shapes within bins to identify clustersCOTE MICHEL L·Filed 2009·Granted Mar 10, 2015·0 cites·16 claims
- 2354US7422841B2Exposure control for phase shifting photolithographic masksSYNOPSYS INC·Filed 2004·Granted Sep 9, 2008·2 cites·8 claims
- 2450US8255840B2Silicon tolerance specification using shapes as design intent markersCOTE MICHEL·Filed 2008·Granted Aug 28, 2012·1 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →