Inventor · disambiguated record
Toshihiko Nagai
Also filed as: NAGAI TOSHIHIKO
9 granted patents·5 pending applications·134 citations·filing 1987–2014
87Inventor score
Files withMATSUSHITA ELECTRIC INDUSTRIAL CO LTD5MITSUBISHI ELECTRIC CORP5EKC TECHNOLOGY K K1NIPPON COLIN CO LTD1RENESAS TECH CORP1
Top patents by PatentIndex Score
14 records- 0188US7250391B2Cleaning composition for removing resists and method of manufacturing semiconductor deviceEKC TECHNOLOGY K K·Filed 2003·Granted Jul 31, 2007·56 cites·9 claims
- 0276US6837963B2Semiconductor device, method of producing a semiconductor device, and semiconductor substrate cleaning apparatus used for the production methodRENESAS TECH CORP·Filed 2001·Granted Jan 4, 2005·19 cites·6 claims
- 0373US6645807B2Method for manufacturing semiconductor deviceMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2002·Granted Nov 11, 2003·16 cites·8 claims
- 0466US6642142B2Substrate cleaning method and method for producing an electronic deviceMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2002·Granted Nov 4, 2003·11 cites·15 claims
- 0561US6586145B2Method of fabricating semiconductor device and semiconductor deviceMITSUBISHI ELECTRIC CORP·Filed 2002·Granted Jul 1, 2003·8 cites·10 claims
- 0658US9927399B2Capillary device for separation and analysis, microfluidic chip for separation and analysis, analysis method for proteins or peptides, electrophoresis instrument, and microfluidic chip electrophoresis instrument for separation and analysisUNIV FUKUSHIMA MEDICAL·Filed 2014·Granted Mar 27, 2018·1 cites·13 claims
- 0742US4838276ABlood pressure cuffNIPPON COLIN CO LTD·Filed 1987·Granted Jun 13, 1989·23 cites·6 claims
- 0840US6531381B2Method and apparatus for cleaning semiconductor device and method of fabricating semiconductor deviceMITSUBISHI ELECTRIC CORP·Filed 2001·Granted Mar 11, 2003·0 cites·7 claims
- 0940US2003139046A1Method and apparatus for cleaning semiconductor device and method of fabricating semiconductor deviceMITSUBISHI ELECTRIC CORP·Filed 2003·Application pending·0 cites
- 1037US2004016447A1Cleaning equipment and cleaning methodMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2003·Application pending·0 cites
- 1136US2003159716A1Wafer cleaning methodMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2002·Application pending·0 cites
- 1235US6451707B2Method of removing reaction product due to plasma ashing of a resist patternMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2000·Granted Sep 17, 2002·0 cites·14 claims
- 1335US2002146911A1Semiconductor device and method of manufacturing the sameMITSUBISHI ELECTRIC CORP·Filed 2001·Application pending·0 cites
- 1434US2003214017A1Method of manufacturing a semiconductor deviceMITSUBISHI ELECTRIC CORP·Filed 2002·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →