Inventor · disambiguated record
Taishih Maw
Also filed as: MAW TAISHIH
9 granted patents·396 citations·filing 1991–1999
91Inventor score
Files withOCG MICROELECTRONIC MATERIALS3OLIN MICROELECTRONIC CHEM INC3CIBA GEIGY CORP1EKC TECHNOLOGY INC1OLIN MICROELECTRONICS CHEMICAL1
Top patents by PatentIndex Score
9 records- 0191US6248704B1Compositions for cleaning organic and plasma etched residues for semiconductors devicesEKC TECHNOLOGY INC·Filed 1999·Granted Jun 19, 2001·116 cites·23 claims
- 0289US5648324APhotoresist stripping compositionOCG MICROELECTRONIC MATERIALS·Filed 1996·Granted Jul 15, 1997·66 cites·4 claims
- 0385US5597678ANon-corrosive photoresist stripper compositionOCG MICROELECTRONIC MATERIALS·Filed 1995·Granted Jan 28, 1997·65 cites·4 claims
- 0473US5665688APhotoresist stripping compositionOLIN MICROELECTRONICS CHEMICAL·Filed 1996·Granted Sep 9, 1997·32 cites·3 claims
- 0571US5759973APhotoresist stripping and cleaning compositionsOLIN MICROELECTRONIC CHEM INC·Filed 1996·Granted Jun 2, 1998·31 cites·15 claims
- 0666US5817610ANon-corrosive cleaning composition for removing plasma etching residuesOLIN MICROELECTRONIC CHEM INC·Filed 1996·Granted Oct 6, 1998·27 cites·8 claims
- 0765US5545353ANon-corrosive photoresist stripper compositionOCG MICROELECTRONIC MATERIALS·Filed 1995·Granted Aug 13, 1996·24 cites·7 claims
- 0864US6020292ANon-corrosive cleaning composition for removing plasma etching residuesOLIN MICROELECTRONIC CHEM INC·Filed 1998·Granted Feb 1, 2000·24 cites·3 claims
- 0957US5189128ASolution stable polyimide resin systemsCIBA GEIGY CORP·Filed 1991·Granted Feb 23, 1993·11 cites·3 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →