Inventor · disambiguated record
Joachim Stuehler
Also filed as: STUEHLER JOACHIM
11 granted patents·4 pending applications·43 citations·filing 2004–2018
88Inventor score
Technology areasG03F
Top patents by PatentIndex Score
15 records- 0190US7408652B2Device and method for the optical measurement of an optical system by using an immersion fluidZEISS CARL SMT AG·Filed 2005·Granted Aug 5, 2008·12 cites·30 claims
- 0279US8988752B2Beam control apparatus for an illumination beam and metrology system comprising an optical system containing such a beam control apparatusZEISS CARL SMT GMBH·Filed 2012·Granted Mar 24, 2015·4 cites·23 claims
- 0378US7755748B2Device and method for range-resolved determination of scattered light, and an illumination maskZEISS CARL SMT AG·Filed 2008·Granted Jul 13, 2010·4 cites·26 claims
- 0471US9001304B2Projection exposure system for microlithography with a measurement deviceMUELLER ULRICH·Filed 2010·Granted Apr 7, 2015·1 cites·44 claims
- 0569US7408631B2Device for the range-resolved determination of scattered light, operating method, illumination mask and image-field maskZEISS CARL SMT AG·Filed 2004·Granted Aug 5, 2008·9 cites·25 claims
- 0669US7019824B2Moire method and measuring system for measuring the distortion of an optical imaging systemZEISS CARL SMT AG·Filed 2004·Granted Mar 28, 2006·11 cites·33 claims
- 0766US8120763B2Device and method for the optical measurement of an optical system by using an immersion fluidWEGMANN ULRICH·Filed 2009·Granted Feb 21, 2012·1 cites·14 claims
- 0862US10114293B2Illumination system and projection objective of a mask inspection apparatusFELDMANN HEIKO·Filed 2012·Granted Oct 30, 2018·1 cites·45 claims
- 0962US2019129318A1Projection exposure system for microlithography with a measurement deviceZEISS CARL SMT GMBH·Filed 2018·Application pending·0 cites
- 1061US10042271B2Projection exposure system for microlithography with a measurement deviceZEISS CARL SMT GMBH·Filed 2017·Granted Aug 7, 2018·0 cites·13 claims
- 1159US8836929B2Device and method for the optical measurement of an optical system by using an immersion fluidZEISS CARL SMT GMBH·Filed 2012·Granted Sep 16, 2014·0 cites·15 claims
- 1257US2009021726A1Device and method for the optical measurement of an optical system by using an immersion fluidZEISS CARL SMT AG·Filed 2008·Application pending·0 cites
- 1356US9696639B2Projection exposure system for microlithography with a measurement deviceZEISS CARL SMT GMBH·Filed 2015·Granted Jul 4, 2017·0 cites·10 claims
- 1455US2012113429A1Device and method for the optical measurement of an optical system by using an immersion fluidWEGMANN ULRICH·Filed 2012·Application pending·0 cites
- 1545US2008128643A1Projection exposure tool for microlithography having a radiation detector for spatially resolved registration of electromagnetic radiationZEISS CARL SMT AG·Filed 2007·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →