Inventor · disambiguated record
Michael Lercel
Also filed as: LERCEL MICHAEL · LERCEL MICHAEL J · LERCEL MICHAEL JAMES
16 granted patents·2 pending applications·194 citations·filing 1998–2021
93Inventor score
Top patents by PatentIndex Score
18 records- 0193US7588879B2Graded spin-on organic antireflective coating for photolithographyIBM·Filed 2008·Granted Sep 15, 2009·15 cites·24 claims
- 0290US6498096B2Borderless contact to diffusion with respect to gate conductor and methods for fabricatingIBM·Filed 2001·Granted Dec 24, 2002·62 cites·11 claims
- 0385US7816069B2Graded spin-on organic antireflective coating for photolithographyIBM·Filed 2006·Granted Oct 19, 2010·7 cites·8 claims
- 0481US6555297B1Etch stop barrier for stencil mask fabricationIBM·Filed 2000·Granted Apr 29, 2003·20 cites·18 claims
- 0574US11086229B2Method to predict yield of a device manufacturing processASML NETHERLANDS BV·Filed 2018·Granted Aug 10, 2021·1 cites·24 claims
- 0673US6261726B1Projection electron-beam lithography masks using advanced materials and membrane sizeIBM·Filed 1999·Granted Jul 17, 2001·30 cites·25 claims
- 0770US11714357B2Method to predict yield of a device manufacturing processASML NETHERLANDS BV·Filed 2021·Granted Aug 1, 2023·0 cites·20 claims
- 0864US6610446B2Information storage on masks for microlithographic toolsIBM·Filed 2001·Granted Aug 26, 2003·7 cites·15 claims
- 0963US6806006B2Integrated cooling substrate for extreme ultraviolet reticleIBM·Filed 2002·Granted Oct 19, 2004·12 cites·20 claims
- 1061US6635389B1Method of defining and forming membrane regions in a substrate for stencil or membrane marksIBM·Filed 2000·Granted Oct 21, 2003·6 cites·39 claims
- 1159US6528215B1Substrate for diamond stencil mask and method for formingIBM·Filed 2000·Granted Mar 4, 2003·5 cites·41 claims
- 1255US6215190B1Borderless contact to diffusion with respect to gate conductor and methods for fabricatingIBM·Filed 1998·Granted Apr 10, 2001·18 cites·7 claims
- 1347US2008009142A1Evaporation control using coatingIBM·Filed 2007·Application pending·0 cites
- 1445US7351348B2Evaporation control using coatingIBM·Filed 2005·Granted Apr 1, 2008·0 cites·7 claims
- 1543US6461797B1Method and apparatus for selectively programming a semiconductor deviceIBM·Filed 1999·Granted Oct 8, 2002·10 cites·6 claims
- 1642US7110195B2Monolithic hard pellicleIBM·Filed 2004·Granted Sep 19, 2006·1 cites·28 claims
- 1740US7067220B2Pattern compensation techniques for charged particle lithographic masksIBM·Filed 2002·Granted Jun 27, 2006·0 cites·11 claims
- 1839US2005287483A1Contact hole printing method and apparatus with single mask, multiple exposures, and optimized pupil filteringIBM·Filed 2004·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →