Inventor · disambiguated record
Ming-Hsin Huang
Also filed as: HUANG MING-HSIN
18 granted patents·279 citations·filing 1998–2021
94Inventor score
Top patents by PatentIndex Score
18 records- 0197US11119522B2Substrate bias generating circuitNUVOTON TECHNOLOGY CORP·Filed 2020·Granted Sep 14, 2021·7 cites·7 claims
- 0291US10324485B2Body bias voltage generating circuitNUVOTON TECHNOLOGY CORP·Filed 2018·Granted Jun 18, 2019·7 cites·11 claims
- 0389US10404054B2Under voltage lockout circuit and device integrating with the same and reference voltage generating circuitNUVOTON TECHNOLOGY CORP·Filed 2017·Granted Sep 3, 2019·4 cites·12 claims
- 0488US6040248AChemistry for etching organic low-k materialsTAIWAN SEMICONDUCTOR MFG·Filed 1998·Granted Mar 21, 2000·92 cites·18 claims
- 0580US8531165B2Single-inductor multiple-output power converterCHEN KE-HORNG·Filed 2010·Granted Sep 10, 2013·6 cites·7 claims
- 0678US8901837B2Circuit including power converterTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Dec 2, 2014·2 cites·21 claims
- 0776US9060396B2Mechanisms for anti-flickeringHUANG MING-HSIN·Filed 2010·Granted Jun 16, 2015·5 cites·20 claims
- 0876US6019906AHard masking method for forming patterned oxygen containing plasma etchable layerTAIWAN SEMICONDUCTOR MFG·Filed 1998·Granted Feb 1, 2000·43 cites·16 claims
- 0971US6007733AHard masking method for forming oxygen containing plasma etchable layerTAIWAN SEMICONDUCTOR MFG·Filed 1998·Granted Dec 28, 1999·41 cites·16 claims
- 1067US10164616B2Level shift circuitNUVOTON TECHNOLOGY CORP·Filed 2018·Granted Dec 25, 2018·1 cites·11 claims
- 1165US6114253AVia patterning for poly(arylene ether) used as an inter-metal dielectricTAIWAN SEMICONDUCTOR MFG·Filed 1999·Granted Sep 5, 2000·29 cites·11 claims
- 1259US6268287B1Polymerless metal hard mask etchingTAIWAN SEMICONDUCTOR MFG·Filed 1999·Granted Jul 31, 2001·25 cites·30 claims
- 1357US11528023B2Under voltage lockout circuit and method thereofNUVOTON TECHNOLOGY CORP·Filed 2021·Granted Dec 13, 2022·0 cites·11 claims
- 1455US11705902B2Supply voltage detecting circuit and circuit system using the sameNUVOTON TECHNOLOGY CORP·Filed 2021·Granted Jul 18, 2023·0 cites·12 claims
- 1552US6492276B1Hard masking method for forming residue free oxygen containing plasma etched layerTAIWAN SEMICONDUCTOR MFG·Filed 1998·Granted Dec 10, 2002·17 cites·26 claims
- 1642US10620657B2Current source circuit providing bias current unrelated to temperatureNUVOTON TECHNOLOGY CORP·Filed 2017·Granted Apr 14, 2020·0 cites·12 claims
- 1742US8471486B2Energy-saving mechanisms in multi-color display devicesHUANG MING-HSIN·Filed 2010·Granted Jun 25, 2013·0 cites·20 claims
- 1840USRE39273EHard masking method for forming patterned oxygen containing plasma etchable layerTAIWAN SEMICONDUCTOR MFG·Filed 2002·Granted Sep 12, 2006·0 cites·28 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →