Inventor · disambiguated record
Kee-Sang Kwon
Also filed as: KWON KEE SANG
23 granted patents·2 pending applications·123 citations·filing 2012–2018
95Inventor score
Top patents by PatentIndex Score
25 records- 0198US9299700B2Semiconductor devices including a dummy gate structure on a finPARK SANG-JINE·Filed 2015·Granted Mar 29, 2016·33 cites·20 claims
- 0294US9755079B2Semiconductor devices including insulating gates and methods for fabricating the samePARK SANG-JINE·Filed 2016·Granted Sep 5, 2017·13 cites·8 claims
- 0394US9548309B2Semiconductor devices including a dummy gate structure on a finPARK SANG-JINE·Filed 2016·Granted Jan 17, 2017·10 cites·7 claims
- 0488US9947672B2Semiconductor devices including a dummy gate structure on a finSAMSUNG ELECTRONICS CO LTD·Filed 2016·Granted Apr 17, 2018·4 cites·8 claims
- 0586US10096605B2Semiconductor devices including a dummy gate structure on a finSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Oct 9, 2018·3 cites·16 claims
- 0686US9117692B2Semiconductor device having dual metal silicide layers and method of manufacturing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2014·Granted Aug 25, 2015·7 cites·12 claims
- 0786US8673724B2Methods of fabricating semiconductor devicesPARK SANG-JINE·Filed 2012·Granted Mar 18, 2014·9 cites·20 claims
- 0885US9960241B2Semiconductor device for manufacturingSAMSUNG ELECTRONICS CO LTD·Filed 2016·Granted May 1, 2018·5 cites·20 claims
- 0984US10128236B2Semiconductor device and method for fabricating the sameJEONG JI MIN·Filed 2016·Granted Nov 13, 2018·6 cites·16 claims
- 1083US8841769B2Semiconductor device having metal plug and method of manufacturing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2013·Granted Sep 23, 2014·7 cites·20 claims
- 1182US9748234B2Semiconductor devices and methods of fabricating the sameKWON KEE SANG·Filed 2015·Granted Aug 29, 2017·6 cites·18 claims
- 1279US10734380B2Semiconductor device and method for fabricating the sameSAMSUNG ELECTRONICS CO LTD·Filed 2018·Granted Aug 4, 2020·2 cites·3 claims
- 1379US8889552B2Semiconductor device having dual metal silicide layers and method of manufacturing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2013·Granted Nov 18, 2014·6 cites·12 claims
- 1477US10847416B2Semiconductor device including self-aligned contact and method of fabricating the semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2018·Granted Nov 24, 2020·2 cites·20 claims
- 1574US10438891B2Integrated circuit deviceSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Oct 8, 2019·2 cites·17 claims
- 1673US10115797B2Finfet semiconductor device and method of manufacturing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2016·Granted Oct 30, 2018·2 cites·16 claims
- 1770US10714472B2Semiconductor devices and methods of fabricating the sameSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Jul 14, 2020·1 cites·18 claims
- 1869US9054210B2Method of fabricating semiconductor devicePARK SANG-JINE·Filed 2012·Granted Jun 9, 2015·2 cites·19 claims
- 1968US9754880B2Semiconductor devices including a contact structure and methods of manufacturing the sameBAEK JAE-JIK·Filed 2016·Granted Sep 5, 2017·2 cites·19 claims
- 2064US9040415B2Semiconductor device and method of fabricating the sameSAMSUNG ELECTRONICS CO LTD·Filed 2014·Granted May 26, 2015·1 cites·20 claims
- 2161US10446561B2Semiconductor devices including a dummy gate structure on a finSAMSUNG ELECTRONICS CO LTD·Filed 2018·Granted Oct 15, 2019·0 cites·20 claims
- 2252US2018197861A1Semiconductor devices including varied depth recesses for contactsSAMSUNG ELECTRONICS CO LTD·Filed 2018·Application pending·0 cites
- 2348US2016351570A1Semiconductor devices including varied depth recesses for contactsSAMSUNG ELECTRONICS CO LTD·Filed 2016·Application pending·0 cites
- 2444US10297474B2Chemical supplier, processing apparatus including the chemical supplierSAMSUNG ELECTRONICS CO LTD·Filed 2014·Granted May 21, 2019·0 cites·21 claims
- 2544US8709942B2Methods for fabricating semiconductor devicesPARK SANG-JINE·Filed 2012·Granted Apr 29, 2014·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →