Inventor · disambiguated record
Tomoyasu Kondo
Also filed as: KONDO TOMOYASU
10 granted patents·4 pending applications·94 citations·filing 2000–2015
86Inventor score
Top patents by PatentIndex Score
14 records- 0185US6706155B2Sputtering apparatus and film manufacturing methodULVAC INC·Filed 2001·Granted Mar 16, 2004·28 cites·13 claims
- 0285US6217730B1Sputtering deviceULVAC CORP·Filed 2000·Granted Apr 17, 2001·27 cites·11 claims
- 0376US6413392B1Sputtering deviceULVAC CORP·Filed 2000·Granted Jul 2, 2002·19 cites·14 claims
- 0474US6469448B2Inductively coupled RF plasma sourceULVAC CORP·Filed 2001·Granted Oct 22, 2002·17 cites·11 claims
- 0562US8158197B2Method for forming tantalum nitride filmGONOHE NARISHI·Filed 2006·Granted Apr 17, 2012·2 cites·9 claims
- 0657US8377269B2Sputtering apparatusULVAC INC·Filed 2009·Granted Feb 19, 2013·1 cites·2 claims
- 0749US8470145B2Cathode unit and sputtering apparatus provided with the sameMORIMOTO NAOKI·Filed 2009·Granted Jun 25, 2013·0 cites·8 claims
- 0848US8105468B2Method for forming tantalum nitride filmGONOHE NARISHI·Filed 2006·Granted Jan 31, 2012·0 cites·13 claims
- 0948US2011048927A1Sputtering apparatus and sputtering methodMORIMOTO NAOKI·Filed 2009·Application pending·0 cites
- 1040US2018057928A1Sputtering apparatusULVAC INC·Filed 2015·Application pending·0 cites
- 1139US8796142B2Method for forming tantalum nitride filmGONOHE NARISHI·Filed 2006·Granted Aug 5, 2014·0 cites·7 claims
- 1239US8158198B2Method for forming tantalum nitride filmGONOHE NARISHI·Filed 2006·Granted Apr 17, 2012·0 cites·13 claims
- 1338US2009162565A1Method for Forming Tantalum Nitride FilmGONOHE NARISHI·Filed 2006·Application pending·0 cites
- 1438US2008199601A1Method for Forming Tantalum Nitride FilmGONOHE NARISHI·Filed 2006·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →