Inventor · disambiguated record
Peter Kochersperger
Also filed as: KOCHERSPERGER PETER · KOCHERSPERGER PETER C · KOCHERSPERGER PETER CONRAD
28 granted patents·3 pending applications·229 citations·filing 1986–2021
96Inventor score
Files withASML HOLDING NV21ASML NETHERLANDS BV2PERKIN ELMER CORP2BLEEKER ARNO JAN1KOCHERSPERGER PETER C1
Top patents by PatentIndex Score
31 records- 0191US6538720B2Lithographic tool with dual isolation system and method for configuring the sameSILICON VALLEY GROUP·Filed 2001·Granted Mar 25, 2003·42 cites·24 claims
- 0289US11333984B2Apparatus for and method of in-situ particle removal in a lithography apparatusASML NETHERLANDS BV·Filed 2019·Granted May 17, 2022·4 cites·21 claims
- 0389US8629973B2Lithographic apparatus and method for illumination uniformity correction and uniformity drift compensationZIMMERMAN RICHARD CARL·Filed 2010·Granted Jan 14, 2014·13 cites·20 claims
- 0485US7472580B2Pressure sensorASML HOLDING NV·Filed 2006·Granted Jan 6, 2009·16 cites·16 claims
- 0584US7278817B2Method for transferring and loading a reticleASML HOLDING NV·Filed 2006·Granted Oct 9, 2007·6 cites·18 claims
- 0684US7021120B2High resolution gas gauge proximity sensorASML HOLDING NV·Filed 2004·Granted Apr 4, 2006·26 cites·28 claims
- 0783US7549321B2Pressure sensorASML HOLDING NV·Filed 2006·Granted Jun 23, 2009·13 cites·17 claims
- 0878US7411652B2Lithographic apparatus and device manufacturing methodASML HOLDING NV·Filed 2004·Granted Aug 12, 2008·13 cites·14 claims
- 0977US7542263B2Overlay correction by reducing wafer slipping after alignmentASML HOLDING NV·Filed 2007·Granted Jun 2, 2009·4 cites·11 claims
- 1075US4778332AWafer flip apparatusPERKIN ELMER CORP·Filed 1987·Granted Oct 18, 1988·50 cites·10 claims
- 1171US7751130B2Optical element damping systemsASML HOLDING NV·Filed 2006·Granted Jul 6, 2010·5 cites·25 claims
- 1270US7158213B2Lithographic tool with dual isolation system and method for configuring the sameASML HOLDING NV·Filed 2005·Granted Jan 2, 2007·2 cites·30 claims
- 1369US8159647B2Lithographic apparatus and device manufacturing methodBLEEKER ARNO JAN·Filed 2008·Granted Apr 17, 2012·2 cites·26 claims
- 1468US6978658B1Proximity sensor with self compensation for mechanism instabilityASML HOLDING NV·Filed 2004·Granted Dec 27, 2005·13 cites·17 claims
- 1567US10209635B2Lithographic apparatus with a patterning device environmentASML HOLDING NV·Filed 2015·Granted Feb 19, 2019·1 cites·30 claims
- 1661US7500380B2Measuring distance using gas gauge proximity sensorASML HOLDING NV·Filed 2006·Granted Mar 10, 2009·4 cites·8 claims
- 1760US7414701B2Method and systems for total focus deviation adjustments on maskless lithography systemsASML HOLDING NV·Filed 2003·Granted Aug 19, 2008·5 cites·28 claims
- 1858US12405227B2Method for region of interest processing for reticle particle detectionASML HOLDING NV·Filed 2021·Granted Sep 2, 2025·0 cites·20 claims
- 1956US2015256058A1Linear Motor and Lithography Arrangement Including Linear MotorASML HOLDING NV·Filed 2015·Application pending·0 cites
- 2055US12189312B2Reticle gripper damper and isolation system for lithographic apparatusesASML HOLDING NV·Filed 2021·Granted Jan 7, 2025·0 cites·20 claims
- 2155US7004715B2Apparatus for transferring and loading a reticle with a robotic reticle end-effectorASML HOLDING NV·Filed 2002·Granted Feb 28, 2006·3 cites·19 claims
- 2252US7164463B2Lithographic tool with dual isolation system and method for configuring the sameASML HOLDING NV·Filed 2003·Granted Jan 16, 2007·2 cites·39 claims
- 2347US9083227B2Linear motor and lithography arrangement including linear motorKOCHERSPERGER PETER C·Filed 2012·Granted Jul 14, 2015·0 cites·13 claims
- 2446US11137694B2Particle suppression systems and methodsASML NETHERLANDS BV·Filed 2018·Granted Oct 5, 2021·0 cites·27 claims
- 2546US9457947B2Lithographic apparatus and device manufacturing methodLANSBERGEN ROBERT GABRIËL MARIA·Filed 2012·Granted Oct 4, 2016·0 cites·33 claims
- 2646US7999939B2Real time telecentricity measurementASML HOLDING NV·Filed 2007·Granted Aug 16, 2011·0 cites·33 claims
- 2745US9669984B2Lithographic apparatus and device manufacturing methodLANSBERGEN ROBERT GABRIEL MARIA·Filed 2012·Granted Jun 6, 2017·0 cites·20 claims
- 2844US7786607B2Overlay correction by reducing wafer slipping after alignmentASML HOLDING NV·Filed 2004·Granted Aug 31, 2010·0 cites·16 claims
- 2943US2007151327A1Gas gauge proximity sensor with internal gas flow controlASML HOLDING NV·Filed 2005·Application pending·0 cites
- 3042US2007151328A1Vacuum driven proximity sensorASML HOLDING NV·Filed 2005·Application pending·0 cites
- 3133US4750857AWafer cassette transfer mechanismPERKIN ELMER CORP·Filed 1986·Granted Jun 14, 1988·5 cites·4 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →