Inventor · disambiguated record
Gerhard Beitel
Also filed as: BEITEL GERHARD · BEITEL GERHARD ADOLF
16 granted patents·7 pending applications·68 citations·filing 1999–2003
91Inventor score
Top patents by PatentIndex Score
23 records- 0175US6787831B2Barrier stack with improved barrier propertiesINFINEON TECHNOLOGIES AG·Filed 2002·Granted Sep 7, 2004·15 cites·23 claims
- 0274US6583507B1Barrier for capacitor over plug structuresFiled 2002·Granted Jun 24, 2003·15 cites·24 claims
- 0362US6821187B2Method for chemical-mechanical polishing of a layer which is a substrate and is a metal selected from a platinum groupINFINEON TECHNOLOGIES AG·Filed 2001·Granted Nov 23, 2004·9 cites·20 claims
- 0457US6686265B2Method of producing a capacitor electrode with a barrier structureINFINEON TECHNOLOGIES AG·Filed 2002·Granted Feb 3, 2004·6 cites·17 claims
- 0556US7031138B2Ferroelectric capacitor and process for its manufactureTOSHIBA KK·Filed 2002·Granted Apr 18, 2006·7 cites·10 claims
- 0652US7042705B2Sidewall structure and method of fabrication for reducing oxygen diffusion to contact plugs during CW hole reactive ion etch processingTOSHIBA KK·Filed 2003·Granted May 9, 2006·3 cites·12 claims
- 0751US6614642B1Capacitor over plug structureINFINEON TECHNOLOGIES AG·Filed 2002·Granted Sep 2, 2003·3 cites·17 claims
- 0849US6897501B2Avoiding shorting in capacitorsINFINEON TECHNOLOGIES AG·Filed 2003·Granted May 24, 2005·4 cites·22 claims
- 0945US6621683B1Memory cells with improved reliabilityINFINEON TECHNOLOGIES AG·Filed 2002·Granted Sep 16, 2003·1 cites·32 claims
- 1044US2004171252A1Reduced contamination of tools in semiconductor processingFiled 2003·Application pending·0 cites
- 1143US7009230B2Barrier stack with improved barrier propertiesTOSHIBA KK·Filed 2003·Granted Mar 7, 2006·0 cites·28 claims
- 1243US6593228B2Method of fabricating a patterned metal-containing layer on a semiconductor waferINFINEON TECHNOLOGIES AG·Filed 2002·Granted Jul 15, 2003·2 cites·11 claims
- 1340US6891713B2Element storage layer in integrated circuitsINFINEON TECHNOLOGIES AG·Filed 2003·Granted May 10, 2005·0 cites·38 claims
- 1438US6552385B2DRAM memory capacitor having three-layer dielectric, and method for its productionINFINEON TECHNOLOGIES AG·Filed 2001·Granted Apr 22, 2003·0 cites·6 claims
- 1537US2004171274A1Method for formation of hardmask elements during a semiconductor device fabrication processFiled 2003·Application pending·0 cites
- 1637US2005127421A1Semiconductor module having an insulation layer and method for fabricating a semiconductor module having an insulation layerINFINEON TECHNOLOGIES AG·Filed 2003·Application pending·0 cites
- 1736US7078309B2Methods for producing a structured metal layerINFINEON TECHNOLOGIES AG·Filed 2000·Granted Jul 18, 2006·0 cites·18 claims
- 1834US6825116B2Method for removing structuresINFINEON TECHNOLOGIES AG·Filed 2001·Granted Nov 30, 2004·0 cites·10 claims
- 1934US2002042208A1Polishing liquid and method for structuring metal oxidesFiled 2001·Application pending·0 cites
- 2034US2009011556A9Method for producing a microelectronic structureBEITEL GERHARD·Filed 2001·Application pending·0 cites
- 2134US2002081853A1Abrasive slurry and process for a chemical-mechanical polishing of a precious-metal surfaceFiled 2001·Application pending·0 cites
- 2234US2002017063A1Polishing liquid and process for patterning metals and metal oxidesFiled 2001·Application pending·0 cites
- 2331US6190991B1Method for fabricating a capacitorSIEMENS AG·Filed 1999·Granted Feb 20, 2001·3 cites·12 claims
Join the waitlist — get patent alerts
Get an alert when Gerhard Beitel files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →