Inventor · disambiguated record
Franz-Josef Stickel
Also filed as: STICKEL FRANZ J · STICKEL FRANZ-JOSEF
15 granted patents·2 pending applications·45 citations·filing 2003–2023
89Inventor score
Files withZEISS CARL SMT GMBH11ZEISS CARL SMT AG3EHM DIRK HEINRICH1LOERING ULRICH1ROCKTAESCHEL MARTIN1
Top patents by PatentIndex Score
17 records- 0191US9316929B2EUV exposure apparatus with reflective elements having reduced influence of temperature variationZEISS CARL SMT GMBH·Filed 2013·Granted Apr 19, 2016·10 cites·22 claims
- 0290US10031423B2EUV exposure apparatus with reflective elements having reduced influence of temperature variationZEISS CARL SMT GMBH·Filed 2017·Granted Jul 24, 2018·4 cites·20 claims
- 0378US8228483B2Projection objective for microlithography, projection exposure apparatus, projection exposure method and optical correction plateLOERING ULRICH·Filed 2010·Granted Jul 24, 2012·6 cites·20 claims
- 0473US6831794B2Objective with at least one aspheric lensZEISS CARL SMT AG·Filed 2003·Granted Dec 14, 2004·15 cites·12 claims
- 0568US10684551B2EUV exposure apparatus with reflective elements having reduced influence of temperature variationZEISS CARL SMT GMBH·Filed 2019·Granted Jun 16, 2020·0 cites·9 claims
- 0668US10146138B2Method for producing an optical element for an optical system, in particular for a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2017·Granted Dec 4, 2018·1 cites·15 claims
- 0765US9921483B2Surface correction of mirrors with decoupling coatingZEISS CARL SMT GMBH·Filed 2015·Granted Mar 20, 2018·1 cites·20 claims
- 0865US7551361B2Lithography lens system and projection exposure system provided with at least one lithography lens system of this typeZEISS CARL SMT AG·Filed 2004·Granted Jun 23, 2009·7 cites·24 claims
- 0963US10317802B2EUV exposure apparatus with reflective elements having reduced influence of temperature variationZEISS CARL SMT GMBH·Filed 2018·Granted Jun 11, 2019·0 cites·21 claims
- 1063US9249501B2Surface correction on coated mirrorsEHM DIRK HEINRICH·Filed 2012·Granted Feb 2, 2016·1 cites·16 claims
- 1159US11213926B2Method for polishing a workpiece in the production of an optical elementZEISS CARL SMT GMBH·Filed 2020·Granted Jan 4, 2022·0 cites·16 claims
- 1258US9746778B2EUV exposure apparatus with reflective elements having reduced influence of temperature variationZEISS CARL SMT GMBH·Filed 2016·Granted Aug 29, 2017·0 cites·14 claims
- 1356US11980990B2Method for machining a workpiece in the production of an optical elementZEISS CARL SMT GMBH·Filed 2020·Granted May 14, 2024·0 cites·15 claims
- 1451US10831114B2Lithography apparatus and methodZEISS CARL SMT GMBH·Filed 2019·Granted Nov 10, 2020·0 cites·20 claims
- 1549US2023288662A1Method for producing a main body of an optical element for semiconductor lithography, and main body of an optical element for semiconductor lithographyZEISS CARL SMT GMBH·Filed 2023·Application pending·0 cites
- 1640US2007024982A1Imaging system for a microlithographic projection exposure systemZEISS CARL SMT AG·Filed 2006·Application pending·0 cites
- 1733US9568845B2Mirror for use in a microlithography projection exposure apparatusROCKTAESCHEL MARTIN·Filed 2012·Granted Feb 14, 2017·0 cites·6 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →