Inventor · disambiguated record
Shigeki Nojima
Also filed as: NOJIMA SHIGEKI
37 granted patents·17 pending applications·360 citations·filing 1999–2019
97Inventor score
Top patents by PatentIndex Score
54 records- 0194US7526748B2Design pattern data preparing method, mask pattern data preparing method, mask manufacturing method, semiconductor device manufacturing method, and program recording mediumTOSHIBA KK·Filed 2005·Granted Apr 28, 2009·19 cites·19 claims
- 0291US7546178B2Aligner evaluation system, aligner evaluation method, a computer program product, and a method for manufacturing a semiconductor deviceTOSHIBA KK·Filed 2007·Granted Jun 9, 2009·14 cites·18 claims
- 0391US7194704B2Design layout preparing methodTOSHIBA KK·Filed 2004·Granted Mar 20, 2007·61 cites·16 claims
- 0489US7278125B2Semiconductor integrated circuit pattern verification method, photomask manufacturing method, semiconductor integrated circuit device manufacturing method, and program for implementing semiconductor integrated circuit pattern verification methodTOSHIBA KK·Filed 2005·Granted Oct 2, 2007·17 cites·20 claims
- 0588US10943048B2Defect inspection apparatus and defect inspection methodTOSHIBA MEMORY CORP·Filed 2019·Granted Mar 9, 2021·6 cites·15 claims
- 0687US7571417B2Method and system for correcting a mask pattern designTOSHIBA KK·Filed 2004·Granted Aug 4, 2009·23 cites·14 claims
- 0787US7337426B2Pattern correcting method, mask making method, method of manufacturing semiconductor device, pattern correction system, and computer-readable recording medium having pattern correction program recorded thereinTOSHIBA KK·Filed 2005·Granted Feb 26, 2008·9 cites·20 claims
- 0887US6334209B1Method for exposure-mask inspection and recording medium on which a program for searching for portions to be measured is recordedTOSHIBA KK·Filed 1999·Granted Dec 25, 2001·64 cites·10 claims
- 0986US6649310B2Method of manufacturing photomaskTOSHIBA KK·Filed 2001·Granted Nov 18, 2003·26 cites·60 claims
- 1085US8078996B2Method and system for correcting a mask pattern designIZUHA KYOKO·Filed 2009·Granted Dec 13, 2011·6 cites·7 claims
- 1184US7788626B2Pattern data correction method, pattern checking method, pattern check program, photo mask producing method, and semiconductor device manufacturing methodTOSHIBA KK·Filed 2005·Granted Aug 31, 2010·7 cites·7 claims
- 1282US7934175B2Parameter adjustment method, semiconductor device manufacturing method, and recording mediumTOSHIBA KK·Filed 2008·Granted Apr 26, 2011·8 cites·20 claims
- 1378US9953126B2Method of wiring layout, semiconductor device, program for supporting design of wiring layout, and method for manufacturing semiconductor deviceTOSHIBA MEMORY CORP·Filed 2014·Granted Apr 24, 2018·4 cites·27 claims
- 1476US7213226B2Pattern dimension correction method and verification method using OPC, mask and semiconductor device fabricated by using the correction method, and system and software product for executing the correction methodTOSHIBA KK·Filed 2004·Granted May 1, 2007·14 cites·20 claims
- 1575US7793252B2Mask pattern preparation method, semiconductor device manufacturing method and recording mediumTOSHIBA KK·Filed 2008·Granted Sep 7, 2010·3 cites·12 claims
- 1674US7794897B2Mask pattern correcting method, mask pattern inspecting method, photo mask manufacturing method, and semiconductor device manufacturing methodTOSHIBA KK·Filed 2005·Granted Sep 14, 2010·3 cites·14 claims
- 1773US8402407B2Semiconductor integrated circuit pattern verification method, photomask manufacturing method, semiconductor integrated circuit device manufacturing method, and program for implementing semiconductor integrated circuit pattern verification methodNOJIMA SHIGEKI·Filed 2011·Granted Mar 19, 2013·3 cites·7 claims
- 1873US7895541B2Semiconductor integrated circuit pattern verification method, photomask manufacturing method, semiconductor integrated circuit device manufacturing method, and program for implementing semiconductor integrated circuit pattern verification methodTOSHIBA KK·Filed 2007·Granted Feb 22, 2011·4 cites·14 claims
- 1972US10040219B2Mold and mold manufacturing methodTOSHIBA MEMORY CORP·Filed 2013·Granted Aug 7, 2018·2 cites·16 claims
- 2071US7090949B2Method of manufacturing a photo mask and method of manufacturing a semiconductor deviceTOSHIBA KK·Filed 2003·Granted Aug 15, 2006·14 cites·16 claims
- 2170US9977855B2Method of wiring layout, semiconductor device, program for supporting design of wiring layout, and method for manufacturing semiconductor deviceTOSHIBA MEMORY CORP·Filed 2014·Granted May 22, 2018·2 cites·21 claims
- 2270US7600213B2Pattern data verification method, pattern data creation method, exposure mask manufacturing method, semiconductor device manufacturing method, and computer program productTOSHIBA KK·Filed 2005·Granted Oct 6, 2009·5 cites·16 claims
- 2369US8142961B2Mask pattern correcting method, mask pattern inspecting method, photo mask manufacturing method, and semiconductor device manufacturing methodKOTANI TOSHIYA·Filed 2010·Granted Mar 27, 2012·2 cites·16 claims
- 2468US7730445B2Pattern data verification method for semiconductor device, computer-readable recording medium having pattern data verification program for semiconductor device recorded, and semiconductor device manufacturing methodTOSHIBA KK·Filed 2007·Granted Jun 1, 2010·4 cites·14 claims
- 2565US7426712B2Lithography simulation method and recording mediumTOSHIBA KK·Filed 2006·Granted Sep 16, 2008·1 cites·8 claims
- 2665US6727026B2Semiconductor integrated circuit patternsTOSHIBA KK·Filed 2001·Granted Apr 27, 2004·12 cites·14 claims
- 2764US8809072B2Sub-resolution assist feature arranging method and computer program product and manufacturing method of semiconductor deviceKODAMA CHIKAAKI·Filed 2011·Granted Aug 19, 2014·1 cites·18 claims
- 2864US7890908B2Method for verifying mask pattern data, method for manufacturing mask, mask pattern verification program, and method for manufacturing semiconductor deviceTOSHIBA KK·Filed 2006·Granted Feb 15, 2011·2 cites·19 claims
- 2964US7008731B2Method of manufacturing a photomask and method of manufacturing a semiconductor device using the photomaskTOSHIBA KK·Filed 2003·Granted Mar 7, 2006·7 cites·14 claims
- 3061US7229721B2Method for evaluating photo mask and method for manufacturing semiconductor deviceTOSHIBA KK·Filed 2003·Granted Jun 12, 2007·6 cites·20 claims
- 3159US2014346701A1Pattern formation device, method for pattern formation, and program for pattern formationTOSHIBA KK·Filed 2014·Application pending·0 cites
- 3257US7949967B2Design Pattern correcting method, process proximity effect correcting method, and semiconductor device manufacturing methodTOSHIBA KK·Filed 2008·Granted May 24, 2011·0 cites·8 claims
- 3357US7269470B2Aligner evaluation system, aligner evaluation method, a computer program product, and a method for manufacturing a semiconductor deviceTOSHIBA KK·Filed 2003·Granted Sep 11, 2007·4 cites·18 claims
- 3455US7164960B2Apparatus for correcting a plurality of exposure tools, method for correcting a plurality of exposure tools, and method for manufacturing semiconductor deviceTOSHIBA KK·Filed 2004·Granted Jan 16, 2007·4 cites·16 claims
- 3554US2012054695A1Pattern Verification Method, Pattern Verification System, Mask Manufacturing Method and Semiconductor Device Manufacturing MethodIZUHA KYOKO·Filed 2011·Application pending·0 cites
- 3651US2013069278A1Pattern formation device, method for pattern formation, and program for pattern formationKOBAYASHI SACHIKO·Filed 2012·Application pending·0 cites
- 3747US2005251781A1Design pattern correcting method, design pattern forming method, process proximity effect correcting method, semiconductor device and design pattern correcting programKOTANI TOSHIYA·Filed 2005·Application pending·0 cites
- 3843US2014183702A1Design method of wiring layout, semiconductor device, program for supporting design of wiring layout, and method for manufacturing semiconductor deviceTOSHIBA KK·Filed 2013·Application pending·0 cites
- 3942US2013168827A1Design method of wiring layout, semiconductor device, program for supporting design of wiring layout, and method for manufacturing semiconductor deviceTOSHIBA KK·Filed 2013·Application pending·0 cites
- 4041US2013249918A1Method of forming drawing pattern, method of generating drawing data, and drawing data generating deviceTOSHIBA KK·Filed 2013·Application pending·0 cites
- 4140US2012192127A1Method of manufacturing semiconductor deviceUSUI SATOSHI·Filed 2012·Application pending·0 cites
- 4240US2005166172A1Critical pattern extracting method, critical pattern extracting program, and method of manufacturing semiconductor deviceFiled 2004·Application pending·0 cites
- 4339US8885949B2Pattern shape determining method, pattern shape verifying method, and pattern correcting methodNOJIMA SHIGEKI·Filed 2011·Granted Nov 11, 2014·0 cites·17 claims
- 4438US7131106B2Integrated circuit pattern designing method, exposure mask manufacturing method, exposure mask, and integrated circuit device manufacturing methodTOSHIBA KK·Filed 2003·Granted Oct 31, 2006·0 cites·18 claims
- 4538US2006039596A1Pattern measuring method, pattern measuring apparatus, photo mask manufacturing method, semiconductor device manufacturing method, and computer program productNOJIMA SHIGEKI·Filed 2005·Application pending·0 cites
- 4637US2013062771A1Design method of wiring layout, semiconductor device, program for supporting design of wiring layout, and method for manufacturing semiconductor deviceKODAMA CHIKAAKI·Filed 2012·Application pending·0 cites
- 4736US2012054697A1Light source shape calculation methodTAKAHATA KAZUHIRO·Filed 2011·Application pending·0 cites
- 4835US2012246602A1Method of preparing pattern, method of manufacturing semiconductor device, and computer program productKOBAYASHI SACHIKO·Filed 2011·Application pending·0 cites
- 4935US2006190875A1Pattern extracting system, method for extracting measuring points, method for extracting patterns, and computer program product for extracting patternsARISAWA YUKIYASU·Filed 2006·Application pending·0 cites
- 5034US8336004B2Dimension assurance of mask using plurality of types of pattern ambient environmentNOJIMA SHIGEKI·Filed 2011·Granted Dec 18, 2012·0 cites·20 claims
Showing the top 50 of 54 patent records by PatentIndex Score.
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