Inventor · disambiguated record
Jeffrey Dysard
Also filed as: DYSARD JEFFREY · DYSARD JEFFREY M
36 granted patents·5 pending applications·312 citations·filing 2003–2019
97Inventor score
Files withCABOT MICROELECTRONICS CORP29EXXONMOBIL RES & ENG CO4DYSARD JEFFREY M2ANJUR SRIRAM1BRUSIC VLASTA1
Top patents by PatentIndex Score
41 records- 0196US9127187B1Mixed abrasive tungsten CMP compositionCABOT MICROELECTRONICS CORP·Filed 2014·Granted Sep 8, 2015·24 cites·26 claims
- 0294US7994057B2Polishing composition and method utilizing abrasive particles treated with an aminosilaneCABOT MICROELECTRONICS CORP·Filed 2008·Granted Aug 9, 2011·30 cites·19 claims
- 0394US7531105B2Polishing composition and method for high silicon nitride to silicon oxide removal rate ratiosCABOT MICROELECTRONICS CORP·Filed 2005·Granted May 12, 2009·28 cites·11 claims
- 0493US9422456B2Colloidal silica chemical-mechanical polishing compositionCABOT MICROELECTRONICS CORP·Filed 2015·Granted Aug 23, 2016·9 cites·44 claims
- 0593US9303188B2Composition for tungsten CMPCABOT MICROELECTRONICS CORP·Filed 2014·Granted Apr 5, 2016·14 cites·20 claims
- 0693US8252687B2Barrier slurry for low-k dielectricsLI SHOUTIAN·Filed 2009·Granted Aug 28, 2012·29 cites·46 claims
- 0792US9499721B2Colloidal silica chemical-mechanical polishing compositionCABOT MICROELECTRONICS CORP·Filed 2015·Granted Nov 22, 2016·8 cites·46 claims
- 0892US9422457B2Colloidal silica chemical-mechanical polishing concentrateCABOT MICROELECTRONICS CORP·Filed 2015·Granted Aug 23, 2016·7 cites·29 claims
- 0992US7585340B2Polishing composition containing polyether amineCABOT MICROELECTRONICS CORP·Filed 2006·Granted Sep 8, 2009·19 cites·7 claims
- 1091US7799210B2Process for removing sulfur from naphthaEXXONMOBIL RES & ENG CO·Filed 2005·Granted Sep 21, 2010·25 cites·14 claims
- 1190US9567491B2Tungsten chemical-mechanical polishing compositionCABOT MICROELECTRONICS CORP·Filed 2015·Granted Feb 14, 2017·7 cites·41 claims
- 1290US9309442B2Composition for tungsten buffingCABOT MICROELECTRONICS CORP·Filed 2014·Granted Apr 12, 2016·6 cites·25 claims
- 1390US9238754B2Composition for tungsten CMPCABOT MICROELECTRONICS CORP·Filed 2014·Granted Jan 19, 2016·9 cites·17 claims
- 1490US9028572B2Polishing composition and method utilizing abrasive particles treated with an aminosilaneGRUMBINE STEVEN·Filed 2008·Granted May 12, 2015·14 cites·7 claims
- 1589US9556363B2Copper barrier chemical-mechanical polishing compositionCABOT MICROELECTRONICS CORP·Filed 2015·Granted Jan 31, 2017·8 cites·36 claims
- 1689US8138091B2Polishing composition and method for high silicon nitride to silicon oxide removal rate ratiosDYSARD JEFFREY M·Filed 2009·Granted Mar 20, 2012·14 cites·11 claims
- 1787US7897061B2Compositions and methods for CMP of phase change alloysCABOT MICROELECTRONICS CORP·Filed 2007·Granted Mar 1, 2011·14 cites·6 claims
- 1885US9803106B2Methods for fabricating a chemical-mechanical polishing compositionCABOT MICROELECTRONICS CORP·Filed 2015·Granted Oct 31, 2017·4 cites·20 claims
- 1983US9434859B2Chemical-mechanical planarization of polymer filmsCABOT MICROELECTRONICS CORP·Filed 2013·Granted Sep 6, 2016·3 cites·13 claims
- 2082US9303190B2Mixed abrasive tungsten CMP compositionCABOT MICROELECTRONICS CORP·Filed 2014·Granted Apr 5, 2016·5 cites·17 claims
- 2181US8906252B1CMP compositions selective for oxide and nitride with high removal rate and low defectivityCABOT MICROELECTRONICS CORP·Filed 2013·Granted Dec 9, 2014·4 cites·23 claims
- 2280US9303189B2Composition for tungsten CMPCABOT MICROELECTRONICS CORP·Filed 2014·Granted Apr 5, 2016·4 cites·13 claims
- 2379US11034862B2Polishing composition and method utilizing abrasive particles treated with an aminosilaneCABOT MICROELECTRONICS CORP·Filed 2019·Granted Jun 15, 2021·1 cites·7 claims
- 2473US8759216B2Compositions and methods for polishing silicon nitride materialsDYSARD JEFFREY·Filed 2006·Granted Jun 24, 2014·6 cites·10 claims
- 2571US9617450B2Polishing composition and method utilizing abrasive particles treated with an aminosilaneCABOT MICROELECTRONICS CORP·Filed 2015·Granted Apr 11, 2017·1 cites·5 claims
- 2670US9165489B2CMP compositions selective for oxide over polysilicon and nitride with high removal rate and low defectivityCABOT MICROELECTRONICS CORP·Filed 2014·Granted Oct 20, 2015·2 cites·21 claims
- 2769US9566686B2Composition for tungsten CMPCABOT MICROELECTRONICS CORP·Filed 2015·Granted Feb 14, 2017·1 cites·8 claims
- 2869US7585808B2Methods for preparing catalystsEXXONMOBIL RES & ENG CO·Filed 2003·Granted Sep 8, 2009·10 cites·37 claims
- 2966US8741009B2Polishing composition containing polyether amineDYSARD JEFFREY M·Filed 2009·Granted Jun 3, 2014·2 cites·11 claims
- 3062US8425797B2Compositions for polishing aluminum/copper and titanium in damascene structuresBRUSIC VLASTA·Filed 2008·Granted Apr 23, 2013·1 cites·8 claims
- 3161US7507327B2Desulfurizing organosulfur heterocycles in feeds with supported sodiumEXXONMOBIL RES & ENG CO·Filed 2005·Granted Mar 24, 2009·2 cites·13 claims
- 3260US9281210B2Wet-process ceria compositions for polishing substrates, and methods related theretoCABOT MICROELECTRONICS CORP·Filed 2013·Granted Mar 8, 2016·1 cites·18 claims
- 3359US10508219B2Polishing composition and method utilizing abrasive particles treated with an aminosilaneCABOT MICROELECTRONICS CORP·Filed 2016·Granted Dec 17, 2019·0 cites·10 claims
- 3453US8623767B2Method for polishing aluminum/copper and titanium in damascene structuresCABOT MICROELECTRONICS CORP·Filed 2013·Granted Jan 7, 2014·0 cites·9 claims
- 3545US9340706B2Mixed abrasive polishing compositionsCABOT MICROELECTRONICS CORP·Filed 2013·Granted May 17, 2016·0 cites·16 claims
- 3645US7837888B2Composition and method for damascene CMPCABOT MICROELECTRONICS CORP·Filed 2006·Granted Nov 23, 2010·0 cites·22 claims
- 3743US2009156006A1Compositions and methods for cmp of semiconductor materialsANJUR SRIRAM·Filed 2007·Application pending·0 cites
- 3842US2007209287A1Composition and method to polish silicon nitrideCABOT MICROELECTRONICS CORP·Filed 2006·Application pending·0 cites
- 3942US2007077865A1Method for controlling polysilicon removalCABOT MICROELECTRONICS CORP·Filed 2005·Application pending·0 cites
- 4040US2008067109A1Method For Upgrading Of Diesel Feed By Treatment With Sulfuric AcidEXXONMOBIL RES & ENG CO·Filed 2004·Application pending·0 cites
- 4135US2007114156A1Selective naphtha hydrodesulfurization with high temperature mercaptan decompositionGREELEY JOHN P·Filed 2005·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →