Inventor · disambiguated record
Camelia Rusu
Also filed as: RUSU CAMELIA
16 granted patents·2 pending applications·138 citations·filing 2003–2021
92Inventor score
Top patents by PatentIndex Score
18 records- 0195US7749353B2High aspect ratio etch using modulation of RF powers of various frequenciesLAM RES CORP·Filed 2006·Granted Jul 6, 2010·30 cites·16 claims
- 0284US7405521B2Multiple frequency plasma processor method and apparatusLAM RES CORP·Filed 2003·Granted Jul 29, 2008·35 cites·45 claims
- 0383US8440473B2Use of spectrum to synchronize RF switching with gas switching during etchXU QING·Filed 2011·Granted May 14, 2013·6 cites·19 claims
- 0483US7144521B2High aspect ratio etch using modulation of RF powers of various frequenciesLAM RES CORP·Filed 2003·Granted Dec 5, 2006·24 cites·15 claims
- 0581US9865472B2Fabrication of a silicon structure and deep silicon etch with profile controlLAM RES CORP·Filed 2016·Granted Jan 9, 2018·3 cites·13 claims
- 0680US7645707B2Etch profile controlLAM RES CORP·Filed 2005·Granted Jan 12, 2010·7 cites·7 claims
- 0775US9330926B2Fabrication of a silicon structure and deep silicon etch with profile controlCHEBI ROBERT·Filed 2008·Granted May 3, 2016·7 cites·32 claims
- 0875US8691698B2Controlled gas mixing for smooth sidewall rapid alternating etch processXU QING·Filed 2012·Granted Apr 8, 2014·3 cites·19 claims
- 0971US6942816B2Methods of reducing photoresist distortion while etching in a plasma processing systemLAM RES CORP·Filed 2003·Granted Sep 13, 2005·14 cites·8 claims
- 1068US9267605B2Pressure control valve assembly of plasma processing chamber and rapid alternating processABATCHEV MIRZAFER·Filed 2011·Granted Feb 23, 2016·2 cites·18 claims
- 1168US7785753B2Method and apparatus for providing mask in semiconductor processingLAM RES CORP·Filed 2006·Granted Aug 31, 2010·3 cites·21 claims
- 1266US8871105B2Method for achieving smooth side walls after Bosch etch processWINNICZEK JAROSLAW W·Filed 2012·Granted Oct 28, 2014·2 cites·19 claims
- 1358US8574447B2Inorganic rapid alternating process for silicon etchASO TSUYOSHI·Filed 2010·Granted Nov 5, 2013·2 cites·20 claims
- 1454US2023149931A1Bioassay substrate having fiducial domains and methods of manufacture thereofNANOSTRING TECHNOLOGIES INC·Filed 2021·Application pending·0 cites
- 1547US2010327413A1Hardmask open and etch profile control with hardmask openLAM RES CORP·Filed 2008·Application pending·0 cites
- 1643US7341953B2Mask profile control for controlling feature profileLAM RES CORP·Filed 2006·Granted Mar 11, 2008·0 cites·3 claims
- 1741US9514955B2Patterning of a hard mask materialLAM RES CORP·Filed 2015·Granted Dec 6, 2016·0 cites·21 claims
- 1840US8609548B2Method for providing high etch rateXU QING·Filed 2011·Granted Dec 17, 2013·0 cites·12 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →