Inventor · disambiguated record
Raimond Visser
Also filed as: VISSER RAIMOND
12 granted patents·4 pending applications·114 citations·filing 1997–2015
89Inventor score
Top patents by PatentIndex Score
16 records- 0185US7307695B2Method and device for alignment of a substrateASML NETHERLANDS BV·Filed 2004·Granted Dec 11, 2007·27 cites·23 claims
- 0277US5881430AVacuum cleaner with power control in dependence on a mode of operation of an electrical brushPHILIPS CORP·Filed 1997·Granted Mar 16, 1999·54 cites·19 claims
- 0368US7486384B2Lithographic support structureASML NETHERLANDS BV·Filed 2004·Granted Feb 3, 2009·11 cites·25 claims
- 0466US7408618B2Lithographic apparatus substrate alignmentASML NETHERLANDS BV·Filed 2005·Granted Aug 5, 2008·2 cites·19 claims
- 0565US7283225B2Particle detection device, lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Granted Oct 16, 2007·2 cites·35 claims
- 0656US10007197B2Sensor system, substrate handling system and lithographic apparatusASML NETHERLANDS BV·Filed 2015·Granted Jun 26, 2018·1 cites·20 claims
- 0754US7123349B2Lithographic projection assembly, substrate handling apparatus and substrate handling methodASML NETHERLANDS BV·Filed 2004·Granted Oct 17, 2006·5 cites·18 claims
- 0850US2008297758A1Lithographic support structureASML NETHERLANDS BV·Filed 2008·Application pending·0 cites
- 0948US7394520B2Temperature conditioned load lock, lithographic apparatus comprising such a load lock and method of manufacturing a substrate with such a load lockASML NETHERLANDS BV·Filed 2004·Granted Jul 1, 2008·10 cites·25 claims
- 1044US7106420B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Sep 12, 2006·1 cites·35 claims
- 1142US2009148604A1Substrate Processing Apparatus and Device Manufacturing MethodASML NETHERLANDS BV·Filed 2008·Application pending·0 cites
- 1240US2013077078A1Lithographic Apparatus and Substrate Handling MethodLAFARRE RAYMOND WILHELMUS LOUIS·Filed 2012·Application pending·0 cites
- 1339US7131999B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Nov 7, 2006·0 cites·24 claims
- 1439US2007035709A1End effector with integrated illumination system for reticle pre-alignment sensorsASML NETHERLANDS BV·Filed 2006·Application pending·0 cites
- 1537US8064730B2Device manufacturing method, orientation determination method and lithographic apparatusVISSER RAIMOND·Filed 2004·Granted Nov 22, 2011·1 cites·16 claims
- 1637US7394525B2Exchangeable object handling apparatus, lithographic apparatus including such exchangeable object handling apparatus, and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Jul 1, 2008·0 cites·35 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →