Inventor · disambiguated record
Patricius Aloysius Jacobus Tinnemans
Also filed as: TINNEMANS PATRICIUS ALOYSIUS J · TINNEMANS PATRICIUS ALOYSIUS JACOBUS
103 granted patents·9 pending applications·625 citations·filing 2004–2024
99Inventor score
Files withASML NETHERLANDS BV93TINNEMANS PATRICIUS ALOYSIUS JACOBUS5HOOGENDAM CHRISTIAAN ALEXANDER4MERTENS JEROEN JOHANNES SOPHIA MARIA3CADEE THEODORUS PETRUS MARIA2
Top patents by PatentIndex Score
112 records- 0198US8233135B2Lithographic apparatus and device manufacturing methodJANSEN HANS·Filed 2009·Granted Jul 31, 2012·55 cites·17 claims
- 0297US11067902B2Computational metrologyASML NETHERLANDS BV·Filed 2018·Granted Jul 20, 2021·9 cites·20 claims
- 0397US10527955B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2019·Granted Jan 7, 2020·4 cites·20 claims
- 0497US9778025B2Method and apparatus for measuring asymmetry of a microstructure, position measuring method, position measuring apparatus, lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2013·Granted Oct 3, 2017·21 cites·25 claims
- 0596US12066764B2Metrology apparatus and method for determining a characteristic of one or more structures on a substrateASML NETHERLANDS BV·Filed 2023·Granted Aug 20, 2024·2 cites·20 claims
- 0696US9846368B2Lithographic apparatus and device manufacturing method utilizing data filteringASML NETHERLANDS BV·Filed 2013·Granted Dec 19, 2017·9 cites·10 claims
- 0796US7804575B2Lithographic apparatus and device manufacturing method having liquid evaporation controlASML NETHERLANDS BV·Filed 2005·Granted Sep 28, 2010·23 cites·44 claims
- 0896US7411653B2Lithographic apparatusASML NETHERLANDS BV·Filed 2004·Granted Aug 12, 2008·49 cites·20 claims
- 0996US7403265B2Lithographic apparatus and device manufacturing method utilizing data filteringASML NETHERLANDS BV·Filed 2005·Granted Jul 22, 2008·21 cites·17 claims
- 1095US11125806B2Metrology apparatus and method for determining a characteristic of one or more structures on a substrateASML NETHERLANDS BV·Filed 2019·Granted Sep 21, 2021·5 cites·15 claims
- 1195US10816909B2Metrology system and method for determining a characteristic of one or more structures on a substrateASML NETHERLANDS BV·Filed 2018·Granted Oct 27, 2020·5 cites·17 claims
- 1295US8542344B2Lithographic apparatus and device manufacturing methodHOOGENDAM CHRISTIAAN ALEXANDER·Filed 2011·Granted Sep 24, 2013·7 cites·37 claims
- 1395US7304715B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Dec 4, 2007·52 cites·39 claims
- 1494US11378893B2Lithographic apparatus and device manufacturing method involving a heaterASML NETHERLANDS BV·Filed 2020·Granted Jul 5, 2022·2 cites·20 claims
- 1594US10527958B2Lithographic methodASML NETHERLANDS BV·Filed 2018·Granted Jan 7, 2020·7 cites·21 claims
- 1694US8553218B2Calibration method and apparatusTINNEMANS PATRICIUS ALOYSIUS JACOBUS·Filed 2010·Granted Oct 8, 2013·18 cites·22 claims
- 1794US7779781B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Aug 24, 2010·45 cites·28 claims
- 1893US10474045B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2016·Granted Nov 12, 2019·6 cites·20 claims
- 1993US7868998B2Lithographic apparatusASML NETHERLANDS BV·Filed 2008·Granted Jan 11, 2011·9 cites·12 claims
- 2091US12032299B2Metrology method and associated metrology and lithographic apparatusesASML NETHERLANDS BV·Filed 2020·Granted Jul 9, 2024·2 cites·25 claims
- 2191US8934082B2Lithographic apparatus and device manufacturing methodMERTENS JEROEN JOHANNES SOPHIA MARIA·Filed 2011·Granted Jan 13, 2015·5 cites·20 claims
- 2290US10331040B2Method of controlling a lithographic apparatus and device manufacturing method, control system for a lithographic apparatus and lithographic apparatusASML NETHERLANDS BV·Filed 2016·Granted Jun 25, 2019·4 cites·20 claims
- 2390US10133192B2Method and apparatus for determining the property of a structure, device manufacturing methodASML NETHERLANDS BV·Filed 2017·Granted Nov 20, 2018·6 cites·19 claims
- 2490US9939742B2Method and apparatus for measuring asymmetry of a microstructure, position measuring method, position measuring apparatus, lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2013·Granted Apr 10, 2018·6 cites·27 claims
- 2590US9436097B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2014·Granted Sep 6, 2016·3 cites·20 claims
- 2690US7379155B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted May 27, 2008·28 cites·26 claims
- 2790US7239373B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted Jul 3, 2007·10 cites·19 claims
- 2889US12366811B2Metrology system and method for determining a characteristic of one or more structures on a substrateASML NETHERLANDS BV·Filed 2024·Granted Jul 22, 2025·0 cites·20 claims
- 2989US10620549B2Method of controlling a lithographic apparatus and device manufacturing method, control system for a lithographic apparatus and lithographic apparatusASML NETHERLANDS BV·Filed 2019·Granted Apr 14, 2020·3 cites·20 claims
- 3089US9188880B2Lithographic apparatus and device manufacturing method involving a heaterCADEE THEODORUS PETRUS MARIA·Filed 2011·Granted Nov 17, 2015·4 cites·32 claims
- 3188US9547241B2Alignment sensor, lithographic apparatus and alignment methodASML NETHERLANDS BV·Filed 2014·Granted Jan 17, 2017·5 cites·20 claims
- 3288US9268242B2Lithographic apparatus and device manufacturing method involving a heater and a temperature sensorCADEE THEODORUS PETRUS MARIA·Filed 2010·Granted Feb 23, 2016·4 cites·38 claims
- 3388US7965373B2Lithographic apparatus and device manufacturing method utilizing a datapath having a balanced calculation loadASML NETHERLANDS BV·Filed 2005·Granted Jun 21, 2011·11 cites·20 claims
- 3488US7936445B2Altering pattern data based on measured optical element characteristicsASML NETHERLANDS BV·Filed 2006·Granted May 3, 2011·11 cites·31 claims
- 3587US10585363B2Alignment systemASML NETHERLANDS BV·Filed 2016·Granted Mar 10, 2020·4 cites·15 claims
- 3687US8142852B2Lithographic apparatus and device manufacturing methodMERTENS JEROEN JOHANNES SOPHIA MARIA·Filed 2010·Granted Mar 27, 2012·4 cites·25 claims
- 3786US11415900B2Metrology system and method for determining a characteristic of one or more structures on a substrateASML NETHERLANDS BV·Filed 2020·Granted Aug 16, 2022·1 cites·20 claims
- 3886US10838310B2Lithographic apparatus and device manufacturing method involving a heaterASML NETHERLANDS BV·Filed 2019·Granted Nov 17, 2020·1 cites·20 claims
- 3986US10241426B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2016·Granted Mar 26, 2019·3 cites·20 claims
- 4085US11029610B2Lithographic methodASML NETHERLANDS BV·Filed 2018·Granted Jun 8, 2021·2 cites·21 claims
- 4185US7307695B2Method and device for alignment of a substrateASML NETHERLANDS BV·Filed 2004·Granted Dec 11, 2007·27 cites·23 claims
- 4284US10466601B2Alignment sensor for lithographic apparatusASML NETHERLANDS BV·Filed 2016·Granted Nov 5, 2019·5 cites·20 claims
- 4384US10248033B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2017·Granted Apr 2, 2019·1 cites·20 claims
- 4484US9940703B2Method of measuring a property of a target structure, inspection apparatus, lithographic system and device manufacturing methodASML NETHERLANDS BV·Filed 2017·Granted Apr 10, 2018·4 cites·18 claims
- 4583US9285686B2Lithographic apparatus involving an immersion liquid supply system with an apertureASML NETHERLANDS BV·Filed 2014·Granted Mar 15, 2016·2 cites·20 claims
- 4683US7864295B2Lithographic apparatus and device manufacturing method utilizing data filteringASML NETHERLANDS BV·Filed 2008·Granted Jan 4, 2011·4 cites·9 claims
- 4783US7830493B2System and method for compensating for radiation induced thermal distortions in a substrate or projection systemASML NETHERLANDS BV·Filed 2005·Granted Nov 9, 2010·10 cites·3 claims
- 4881US9753380B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2016·Granted Sep 5, 2017·1 cites·20 claims
- 4981US7403261B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Jul 22, 2008·14 cites·20 claims
- 5080US11009343B2Metrology apparatus and method for determining a characteristic of one or more structures on a substrateASML NETHERLANDS BV·Filed 2019·Granted May 18, 2021·2 cites·15 claims
Showing the top 50 of 112 patent records by PatentIndex Score.
Join the waitlist — get patent alerts
Get an alert when Patricius Aloysius Jacobus Tinnemans files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →