Inventor · disambiguated record
James G. Ryan
Also filed as: RYAN JAMES G · RYAN JAMES GARDNER
51 granted patents·2,580 citations·filing 1983–2010
99Inventor score
Top patents by PatentIndex Score
51 records- 0199US5326430ACooling microfan arrangements and processIBM·Filed 1993·Granted Jul 5, 1994·174 cites·7 claims
- 0297US5134460AAluminum bump, reworkable bump, and titanium nitride structure for tab bondingIBM·Filed 1990·Granted Jul 28, 1992·265 cites·15 claims
- 0396US5563105APECVD method of depositing fluorine doped oxide using a fluorine precursor containing a glass-forming elementIBM·Filed 1994·Granted Oct 8, 1996·332 cites·20 claims
- 0496US5126006APlural level chip maskingIBM·Filed 1991·Granted Jun 30, 1992·133 cites·35 claims
- 0595US4464701AProcess for making high dielectric constant nitride based materials and devices using the sameIBM·Filed 1983·Granted Aug 7, 1984·82 cites·27 claims
- 0694US5130779ASolder mass having conductive encapsulating arrangementIBM·Filed 1990·Granted Jul 14, 1992·185 cites·47 claims
- 0793US5885425AMethod for selective material deposition on one side of raised or recessed featuresIBM·Filed 1995·Granted Mar 23, 1999·88 cites·16 claims
- 0893US4840302AChromium-titanium alloyIBM·Filed 1988·Granted Jun 20, 1989·86 cites·15 claims
- 0992US5296775ACooling microfan arrangements and processIBM·Filed 1992·Granted Mar 22, 1994·66 cites·13 claims
- 1092US5251806AMethod of forming dual height solder interconnectionsIBM·Filed 1992·Granted Oct 12, 1993·144 cites·48 claims
- 1189US7922796B2Chemical and particulate filters containing chemically modified carbon nanotube structuresIBM·Filed 2010·Granted Apr 12, 2011·4 cites·10 claims
- 1289US5909044AProcess for forming a high density semiconductor deviceIBM·Filed 1997·Granted Jun 1, 1999·57 cites·16 claims
- 1387US7708816B2Chemical and particulate filters containing chemically modified carbon nanotube structuresIBM·Filed 2008·Granted May 4, 2010·6 cites·13 claims
- 1486US6140217ATechnique for extending the limits of photolithographyIBM·Filed 1998·Granted Oct 31, 2000·77 cites·15 claims
- 1586US5213916AMethod of making a gray level maskIBM·Filed 1990·Granted May 25, 1993·45 cites·25 claims
- 1680US5843363AAblation patterning of multi-layered structuresSIEMENS AG·Filed 1995·Granted Dec 1, 1998·51 cites·14 claims
- 1779US8512458B2Chemical and particulate filters containing chemically modified carbon nanotube structuresHOLMES STEVEN J·Filed 2008·Granted Aug 20, 2013·11 cites·19 claims
- 1879US7674324B2Exposures system including chemical and particulate filters containing chemically modified carbon nanotube structuresIBM·Filed 2008·Granted Mar 9, 2010·5 cites·10 claims
- 1977US5334467AGray level maskIBM·Filed 1993·Granted Aug 2, 1994·27 cites·5 claims
- 2076US7459013B2Chemical and particulate filters containing chemically modified carbon nanotube structuresIBM·Filed 2004·Granted Dec 2, 2008·23 cites·1 claims
- 2176US5091289AProcess for forming multi-level coplanar conductor/insulator films employing photosensitive polyimide polymer compositionsIBM·Filed 1990·Granted Feb 25, 1992·56 cites·13 claims
- 2275US6204112B1Process for forming a high density semiconductor deviceIBM·Filed 1999·Granted Mar 20, 2001·26 cites·17 claims
- 2375US6199269B1Manipulation of micromechanical objectsIBM·Filed 1997·Granted Mar 13, 2001·41 cites·18 claims
- 2473US5401675AMethod of depositing conductors in high aspect ratio apertures using a collimatorFiled 1993·Granted Mar 28, 1995·49 cites·12 claims
- 2570US6228744B1Manufacturing methods and uses for micro pipe systemsIBM·Filed 1999·Granted May 8, 2001·31 cites·12 claims
- 2669US5960318ABorderless contact etch process with sidewall spacer and selective isotropic etch processSIEMENS AG·Filed 1995·Granted Sep 28, 1999·39 cites·20 claims
- 2769US5763918AESD structure that employs a schottky-barrier to reduce the likelihood of latch-upIBM·Filed 1996·Granted Jun 9, 1998·29 cites·8 claims
- 2869US5589706AFuse link structures through the addition of dummy structuresIBM·Filed 1995·Granted Dec 31, 1996·36 cites·8 claims
- 2968US5712702AMethod and apparatus for determining chamber cleaning end pointIBM·Filed 1996·Granted Jan 27, 1998·30 cites·19 claims
- 3067US5529670AMethod of depositing conductors in high aspect ratio apertures under high temperature conditionsIBM·Filed 1993·Granted Jun 25, 1996·37 cites·10 claims
- 3167US5356837AMethod of making epitaxial cobalt silicide using a thin metal underlayerIBM·Filed 1993·Granted Oct 18, 1994·39 cites·34 claims
- 3264US6144037ACapacitor charging sensorIBM·Filed 1998·Granted Nov 7, 2000·17 cites·20 claims
- 3364US6031286ASemiconductor structures containing a micro pipe system thereinIBM·Filed 1997·Granted Feb 29, 2000·25 cites·8 claims
- 3464US5972788AMethod of making flexible interconnections with dual-metal-dual-stud structureIBM·Filed 1996·Granted Oct 26, 1999·25 cites·17 claims
- 3564US5124561AProcess for X-ray mask warpage reductionIBM·Filed 1991·Granted Jun 23, 1992·18 cites·32 claims
- 3660US5766497AAblation pattering of multilayered structuresSIEMENS AG·Filed 1997·Granted Jun 16, 1998·20 cites·3 claims
- 3758US6337516B1Technique for extending the limits of photolithographyIBM·Filed 2000·Granted Jan 8, 2002·7 cites·20 claims
- 3857US5776826ACrack stop formation for high-productivity processesIBM·Filed 1996·Granted Jul 7, 1998·22 cites·7 claims
- 3957US5086016AMethod of making semiconductor device contact including transition metal-compound dopant sourceIBM·Filed 1990·Granted Feb 4, 1992·27 cites·5 claims
- 4057US4490193AMethod for making diffusions into a substrate and electrical connections thereto using rare earth boride materialsIBM·Filed 1983·Granted Dec 25, 1984·13 cites·17 claims
- 4156US5933718AMethod for electrostatic discharge protection through electric field emissionIBM·Filed 1997·Granted Aug 3, 1999·16 cites·4 claims
- 4255US6376911B1Planarized final passivation for semiconductor devicesIBM·Filed 1995·Granted Apr 23, 2002·20 cites·5 claims
- 4355US5711858AProcess for depositing a conductive thin film upon an integrated circuit substrateIBM·Filed 1995·Granted Jan 27, 1998·20 cites·18 claims
- 4453US5229257AProcess for forming multi-level coplanar conductor/insulator films employing photosensitive polymide polymer compositionsIBM·Filed 1990·Granted Jul 20, 1993·22 cites·11 claims
- 4545US6656369B2Method for fabricating a scanning probe microscope probeIBM·Filed 2002·Granted Dec 2, 2003·2 cites·20 claims
- 4645US5757879ATungsten absorber for x-ray maskIBM·Filed 1996·Granted May 26, 1998·9 cites·14 claims
- 4743US6576848B1Integrated circuit chip wiring structure with crossover capability and method of manufacturing the sameIBM·Filed 1996·Granted Jun 10, 2003·11 cites·7 claims
- 4843US5636258AIn-situ temperature measurement using X-ray diffractionSIEMENS AG·Filed 1995·Granted Jun 3, 1997·15 cites·13 claims
- 4941US6426544B1Flexible interconnections with dual-metal dual-stud structureIBM·Filed 1999·Granted Jul 30, 2002·7 cites·11 claims
- 5040US4481046AMethod for making diffusions into a substrate and electrical connections thereto using silicon containing rare earth hexaboride materialsIBM·Filed 1983·Granted Nov 6, 1984·10 cites·14 claims
Showing the top 50 of 51 patent records by PatentIndex Score.
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