Inventor · disambiguated record
Florian Bach
Also filed as: BACH FLORIAN
17 granted patents·2 pending applications·60 citations·filing 2008–2018
92Inventor score
Top patents by PatentIndex Score
19 records- 0196US9013684B2Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusXALTER STEFAN·Filed 2012·Granted Apr 21, 2015·17 cites·18 claims
- 0288US9411241B2Facet mirror for use in a projection exposure apparatus for microlithographyDINGER UDO·Filed 2010·Granted Aug 9, 2016·11 cites·27 claims
- 0385US8339577B2Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusXALTER STEFAN·Filed 2009·Granted Dec 25, 2012·9 cites·31 claims
- 0484US8767176B2Microlithographic projection exposure apparatusBLEIDISTEL SASCHA·Filed 2011·Granted Jul 1, 2014·6 cites·30 claims
- 0582US9996012B2Facet mirror for use in a projection exposure apparatus for microlithographyZEISS CARL SMT GMBH·Filed 2016·Granted Jun 12, 2018·2 cites·16 claims
- 0682US9523922B2Illumination system of a microlithographic projection exposure apparatus having a temperature control deviceZEISS CARL SMT GMBH·Filed 2014·Granted Dec 20, 2016·3 cites·21 claims
- 0780US9897925B2Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2015·Granted Feb 20, 2018·1 cites·18 claims
- 0876US9448384B2Arrangement for mounting an optical elementZEISS CARL SMT GMBH·Filed 2013·Granted Sep 20, 2016·3 cites·27 claims
- 0975US9274434B2Light modulator and illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2014·Granted Mar 1, 2016·2 cites·20 claims
- 1073US9239229B2Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2015·Granted Jan 19, 2016·1 cites·13 claims
- 1169US8797507B2Illumination system of a microlithographic projection exposure apparatus having a temperature control deviceBACH FLORIAN·Filed 2011·Granted Aug 5, 2014·2 cites·14 claims
- 1266US9001309B2Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2014·Granted Apr 7, 2015·0 cites·30 claims
- 1365US2018246415A1Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2018·Application pending·0 cites
- 1462US9013676B2Individual mirror for constructing a faceted mirror, in particular for use in a projection exposure system for microlithographyWERBER ARMIN·Filed 2011·Granted Apr 21, 2015·2 cites·24 claims
- 1560US9019475B2Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2014·Granted Apr 28, 2015·0 cites·26 claims
- 1659US8717531B2Mirror for guiding a radiation bundleWALDIS SEVERIN·Filed 2010·Granted May 6, 2014·1 cites·20 claims
- 1758US9535336B2Microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2014·Granted Jan 3, 2017·0 cites·22 claims
- 1837US8102506B2Method and device for controlling a plurality of actuators and an illumination device for lithographyROHE THOMAS·Filed 2008·Granted Jan 24, 2012·0 cites·25 claims
- 1937US2015107550A1Method for controlling and regulating an internal combustion engine according to the hcci combustion methodREMELE JÖRG·Filed 2013·Application pending·0 cites
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