Inventor · disambiguated record
Willem Jurrianus Venema
Also filed as: VENEMA WILLEM J · VENEMA WILLEM JURRIANUS
23 granted patents·2 pending applications·154 citations·filing 1985–2017
95Inventor score
Files withASML NETHERLANDS BV19PHILIPS CORP2DEN BOEF ARIE JEFFREY1PROSYENTSOV VITALIY1TEN KATE NICOLAAS1
Top patents by PatentIndex Score
25 records- 0188US9417533B2Method of operating a patterning device and lithographic apparatusPROSYENTSOV VITALIY·Filed 2011·Granted Aug 16, 2016·15 cites·20 claims
- 0286US7233384B2Lithographic apparatus and device manufacturing method, and device manufactured thereby for calibrating an imaging system with a sensorASML NETHERLANDS BV·Filed 2005·Granted Jun 19, 2007·10 cites·20 claims
- 0385US7595496B2Optimized correction of wafer thermal deformations in a lithographic processASML NETHERLANDS BV·Filed 2007·Granted Sep 29, 2009·7 cites·15 claims
- 0485US7221514B2Variable lens and exposure systemASML NETHERLANDS BV·Filed 2005·Granted May 22, 2007·13 cites·16 claims
- 0584US9958788B2Method of operating a patterning device and lithographic apparatusASML NETHERLANDS BV·Filed 2017·Granted May 1, 2018·2 cites·20 claims
- 0683US7830493B2System and method for compensating for radiation induced thermal distortions in a substrate or projection systemASML NETHERLANDS BV·Filed 2005·Granted Nov 9, 2010·10 cites·3 claims
- 0782US7250237B2Optimized correction of wafer thermal deformations in a lithographic processASML NETHERLANDS BV·Filed 2003·Granted Jul 31, 2007·19 cites·24 claims
- 0881US7477772B2Lithographic apparatus and device manufacturing method utilizing 2D run length encoding for image data compressionASML NETHERLANDS BV·Filed 2005·Granted Jan 13, 2009·8 cites·32 claims
- 0974US7209216B2Lithographic apparatus and device manufacturing method utilizing dynamic correction for magnification and position in maskless lithographyASML NETHERLANDS BV·Filed 2005·Granted Apr 24, 2007·4 cites·14 claims
- 1073US7460309B2Variable lens and exposure systemASML NETHERLANDS BV·Filed 2007·Granted Dec 2, 2008·5 cites·10 claims
- 1172US8773637B2Lithographic apparatus and device manufacturing method of applying a pattern to a substrate using sensor and alignment markVAN DE KERKHOF MARCUS ADRIANUS·Filed 2010·Granted Jul 8, 2014·2 cites·16 claims
- 1271US7230677B2Lithographic apparatus and device manufacturing method utilizing hexagonal image gridsASML NETHERLANDS BV·Filed 2004·Granted Jun 12, 2007·10 cites·16 claims
- 1366US7528933B2Lithographic apparatus and device manufacturing method utilizing a MEMS mirror with large deflection using a non-linear spring arrangementASML NETHERLANDS BV·Filed 2006·Granted May 5, 2009·2 cites·15 claims
- 1463US4746789AReading device for bar codesPHILIPS CORP·Filed 1985·Granted May 24, 1988·28 cites·16 claims
- 1562US8279396B2Lithographic apparatus and device manufacturing methodTEN KATE NICOLAAS·Filed 2008·Granted Oct 2, 2012·1 cites·35 claims
- 1662US7391503B2System and method for compensating for thermal expansion of lithography apparatus or substrateASML NETHERLANDS BV·Filed 2005·Granted Jun 24, 2008·2 cites·6 claims
- 1762US7307694B2Lithographic apparatus, radiation beam inspection device, method of inspecting a beam of radiation and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Granted Dec 11, 2007·1 cites·20 claims
- 1854US9658541B2Lithographic apparatus, device manufacturing method, and method of applying a pattern to a substrateASML NETHERLANDS BV·Filed 2014·Granted May 23, 2017·0 cites·18 claims
- 1954US9568833B2Method of operating a patterning device and lithographic apparatusASML NETHERLANDS BV·Filed 2014·Granted Feb 14, 2017·0 cites·20 claims
- 2054US7671319B2Lithographic apparatus, device manufacturing method and energy sensorASML NETHERLANDS BV·Filed 2007·Granted Mar 2, 2010·0 cites·29 claims
- 2150US2007201013A1Lithographic apparatus, device manufacturing method and energy sensorASML NETHERLANDS BV·Filed 2006·Application pending·0 cites
- 2246US2009290139A1Substrate table, sensor and methodASML NETHERLANDS BV·Filed 2009·Application pending·0 cites
- 2343US5199082AMethod of detecting an amplitude transient in a field of elements having a multivalent amplitude distribution, device suitable for performing the method, and video system including the devicePHILIPS CORP·Filed 1991·Granted Mar 30, 1993·12 cites·14 claims
- 2442US7391676B2Ultrasonic distance sensorsASML NETHERLANDS BV·Filed 2004·Granted Jun 24, 2008·3 cites·21 claims
- 2539US8675210B2Level sensor, lithographic apparatus, and substrate surface positioning methodDEN BOEF ARIE JEFFREY·Filed 2012·Granted Mar 18, 2014·0 cites·9 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →