Inventor · disambiguated record
Hendrik Antony Johannes Neerhof
Also filed as: NEERHOF HENDRIK A J · NEERHOF HENDRIK ANTONY JOHANNE · NEERHOF HENDRIK ANTONY JOHANNES
10 granted patents·5 pending applications·59 citations·filing 2003–2011
86Inventor score
Files withASML NETHERLANDS BV10IVANOV VLADIMIR VITALEVICH1LOOPSTRA ERIK ROELOF1NEERHOF HENDRIK ANTONY JOHANNES1STEINHOFF JENS ARNO1
Top patents by PatentIndex Score
15 records- 0191US7187433B2Electrostatic clamp assembly for a lithographic apparatusASML NETHERLANDS BV·Filed 2005·Granted Mar 6, 2007·18 cites·19 claims
- 0287US8476167B2Lithographic apparatus and method of manufacturing an electrostatic clamp for a lithographic apparatusVAN MIERLO HUBERT ADRIAAN·Filed 2011·Granted Jul 2, 2013·14 cites·13 claims
- 0376US9298110B2Radiation source apparatus, lithographic apparatus, method of generating and delivering radiation and method for manufacturing a deviceSTEINHOFF JENS ARNO·Filed 2011·Granted Mar 29, 2016·6 cites·19 claims
- 0468US7041989B1Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted May 9, 2006·9 cites·20 claims
- 0560US7245357B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2003·Granted Jul 17, 2007·8 cites·20 claims
- 0649US7361911B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Apr 22, 2008·2 cites·22 claims
- 0749US2007170376A1Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Application pending·0 cites
- 0848US7375353B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Granted May 20, 2008·0 cites·20 claims
- 0947US7110090B2Lithographic apparatus and method to detect correct clamping of an objectASML NETHERLANDS BV·Filed 2004·Granted Sep 19, 2006·2 cites·17 claims
- 1044US2007139855A1Lithographic apparatus and method of manufacturing an electrostatic clamp for a lithographic apparatusASML NETHERLANDS BV·Filed 2005·Application pending·0 cites
- 1140US7119346B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Oct 10, 2006·0 cites·12 claims
- 1239US2013194562A1Lithographic Apparatus and Device Manufacturing MethodNEERHOF HENDRIK ANTONY JOHANNES·Filed 2011·Application pending·0 cites
- 1338US2012026480A1Image-Compensating Addressable Electrostatic Chuck SystemLOOPSTRA ERIK ROELOF·Filed 2011·Application pending·0 cites
- 1431US8013981B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2007·Granted Sep 6, 2011·0 cites·19 claims
- 1531US2013070218A1System for removing contaminant particles, lithographic apparatus, method for removing contaminant particles and method for manufacturing a deviceIVANOV VLADIMIR VITALEVICH·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →