Inventor · disambiguated record
Masayuki Oie
Also filed as: OIE MASAYUKI
8 granted patents·165 citations·filing 1985–1997
88Inventor score
Top patents by PatentIndex Score
8 records- 0179US5532107APositive resist compositionNIPPON ZEON CO·Filed 1994·Granted Jul 2, 1996·31 cites·22 claims
- 0275US5112719APositive resist composition containing alkali-soluble phenolic resin, quinonediazide sulfonic acid ester photosensitive agent and polyhydroxy sensitizerNIPPON ZEON CO·Filed 1990·Granted May 12, 1992·30 cites·1 claims
- 0374US5707784AMethod of forming chemically amplified resist pattern and manufacturing for semiconductor device by using the chemically amplified resist patternFUJITSU LTD·Filed 1995·Granted Jan 13, 1998·36 cites·13 claims
- 0462US5688628AResist compositionNIPPON ZEON CO·Filed 1994·Granted Nov 18, 1997·39 cites·13 claims
- 0547US5306596APositive resist composition comprising a polyphenolic o-quinone diazide sulfonateNIPPON ZEON CO·Filed 1990·Granted Apr 26, 1994·7 cites·3 claims
- 0646US5773190AResist compositionNIPPON ZEON CO·Filed 1997·Granted Jun 30, 1998·10 cites·7 claims
- 0745US4654292APhotoresist composition containing a pyrazole compound anti-halation agentNIPPON ZEON CO·Filed 1985·Granted Mar 31, 1987·8 cites·7 claims
- 0837US5166033APositive resist composition containing quinone diazide sulfonate ester of vinylphenol compounds or isopropenylphenol compoundsNIPPON ZEON CO·Filed 1990·Granted Nov 24, 1992·4 cites·5 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →