Inventor · disambiguated record
Isamu Hijikata
Also filed as: HIJIKATA ISAMU
17 granted patents·787 citations·filing 1980–1993
96Inventor score
Top patents by PatentIndex Score
17 records- 0194US4318767AApparatus for the treatment of semiconductor wafers by plasma reactionTOKYO OHKA KOGYO CO LTD·Filed 1980·Granted Mar 9, 1982·112 cites·7 claims
- 0293US5022979AElectrode for use in the treatment of an object in a plasmaTOKYO OHKA KOGYO CO LTD·Filed 1988·Granted Jun 11, 1991·58 cites·7 claims
- 0393US5006220AElectrode for use in the treatment of an object in a plasmaTOKYO OHKA KOGYO CO LTD·Filed 1990·Granted Apr 9, 1991·89 cites·2 claims
- 0492US5584647AObject handling devicesTOKYO OHKA KOGYO CO LTD·Filed 1993·Granted Dec 17, 1996·146 cites·4 claims
- 0587US5083896AObject handling deviceTOKYO OHKA KOGYO CO LTD·Filed 1989·Granted Jan 28, 1992·76 cites·8 claims
- 0687US4483651AAutomatic apparatus for continuous treatment of leaf materials with gas plasmaTOKYO OHKA KOGYO CO LTD·Filed 1981·Granted Nov 20, 1984·58 cites·6 claims
- 0784US4578559APlasma etching methodTOKYO OHKA KOGYO CO LTD·Filed 1984·Granted Mar 25, 1986·23 cites·10 claims
- 0883US4550239AAutomatic plasma processing device and heat treatment deviceTOKYO DENSHI KAGAKU KABUSHIKI·Filed 1982·Granted Oct 29, 1985·57 cites·17 claims
- 0974US4749436AEquipment for thermal stabilization process of photoresist pattern on semiconductor waferTOKYO OHKA KOGYO CO LTD·Filed 1987·Granted Jun 7, 1988·23 cites·6 claims
- 1072US4550242AAutomatic plasma processing device and heat treatment device for batch treatment of workpiecesTOKYO DENSHI KAGAKU KABUSHIKI·Filed 1982·Granted Oct 29, 1985·36 cites·22 claims
- 1169US4900582AMethod for improving film quality of silica-based filmsTOKYO OHKA KOGYO CO LTD·Filed 1988·Granted Feb 13, 1990·34 cites·22 claims
- 1268USD291413SWafer holding frameTOKYO DENSHI KAGAKU KK·Filed 1985·Granted Aug 18, 1987·11 cites·1 claims
- 1366US4894254AMethod of forming silicone filmTOKYO OHKA KOGYO CO LTD·Filed 1988·Granted Jan 16, 1990·30 cites·22 claims
- 1463US4868096ASurface treatment of silicone-based coating filmsTOKYO OHKA KOGYO CO LTD·Filed 1987·Granted Sep 19, 1989·16 cites·10 claims
- 1559US4946537APlasma reactorTOKYO OHKA KOGYO CO LTD·Filed 1989·Granted Aug 7, 1990·9 cites·9 claims
- 1634US5254214APlasma taper etching for semiconductor device fabricationTOKYO OHKA KOGYO CO LTD·Filed 1991·Granted Oct 19, 1993·6 cites·13 claims
- 1732US4465553AMethod for dry etching of a substrate surfaceTOKYO DENSHI KAGAKU KK·Filed 1983·Granted Aug 14, 1984·3 cites·2 claims
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →