Inventor · disambiguated record
Mark A. Spak
Also filed as: SPAK MARK · SPAK MARK A
15 granted patents·1 pending application·353 citations·filing 1978–2004
94Inventor score
Top patents by PatentIndex Score
16 records- 0196US4220706AEtchant solution containing HF-HnO3 -H2 SO4 -H2 O2RCA CORP·Filed 1978·Granted Sep 2, 1980·82 cites·5 claims
- 0277US5019488AMethod of producing an image reversal negative photoresist having a photo-labile blocked imideHOECHST CELANESE CORP·Filed 1990·Granted May 28, 1991·34 cites·35 claims
- 0376US4931381AImage reversal negative working O-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatmentHOECHST CELANESE CORP·Filed 1988·Granted Jun 5, 1990·27 cites·16 claims
- 0474US6187506B1Antireflective coating for photoresist compositionsCLARIANT FINANCE BVI LTD·Filed 1999·Granted Feb 13, 2001·38 cites·28 claims
- 0574US4297393AMethod of applying thin metal deposits to a substrateRCA CORP·Filed 1980·Granted Oct 27, 1981·32 cites·20 claims
- 0673US4885232AHigh temperature post exposure baking treatment for positive photoresist compositionsHOECHST CELANESE CORP·Filed 1986·Granted Dec 5, 1989·23 cites·15 claims
- 0767US5922503AProcess for obtaining a lift-off imaging profileCLARIANT FINANCE BVI LTD·Filed 1997·Granted Jul 13, 1999·30 cites·15 claims
- 0867US5399456AImage reversal negative working photoresist containing O-quinone diazide and cross-linking compoundHOECHST CELANESE CORP·Filed 1992·Granted Mar 21, 1995·19 cites·11 claims
- 0963US6852465B2Photoresist composition for imaging thick filmsCLARIANT INT LTD·Filed 2003·Granted Feb 8, 2005·7 cites·20 claims
- 1059US4174252AMethod of defining contact openings in insulating layers on semiconductor devices without the formation of undesirable pinholesRCA CORP·Filed 1978·Granted Nov 13, 1979·17 cites·9 claims
- 1149US4929536AImage reversal negative working O-napthoquinone diazide and cross-linking compound containing photoresist process with thermal curingHOECHST CELANESE CORP·Filed 1988·Granted May 29, 1990·13 cites·16 claims
- 1243US5256522AImage reversal negative working O-naphthoquinone diazide and cross-linking compound containing photoresist process with thermal curingHOECHST CELANESE CORP·Filed 1991·Granted Oct 26, 1993·7 cites·21 claims
- 1341US5324430AHigh performance pan composite membranesHOECHST CELANESE CORP·Filed 1993·Granted Jun 28, 1994·12 cites·14 claims
- 1439US6372414B1Lift-off process for patterning fine metal linesCLARIANT FINANCE BVI LTD·Filed 1999·Granted Apr 16, 2002·7 cites·7 claims
- 1537US5217840AImage reversal negative working o-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatment and element produced therefromHOECHST CELANESE CORP·Filed 1990·Granted Jun 8, 1993·5 cites·22 claims
- 1631US2005282093A1Aqueous edge bead removerDAMMEL RALPH R·Filed 2004·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →