Inventor · disambiguated record
Eiji Yoneda
Also filed as: YONEDA EIJI
22 granted patents·14 pending applications·386 citations·filing 1989–2025
95Inventor score
Files withJSR CORP13TOSHIBA KK10MITSUBISHI NUCLEAR FUEL6MITSUBISHI MATERIALS CORP2KANZAKI PAPER MFG CO LTD1
Top patents by PatentIndex Score
36 records- 0196US7812105B2Compound, polymer, and radiation-sensitive compositionJSR CORP·Filed 2006·Granted Oct 12, 2010·25 cites·19 claims
- 0295US6908722B2Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin compositionJSR CORP·Filed 2002·Granted Jun 21, 2005·200 cites·21 claims
- 0394US7897821B2Sulfonium compoundJSR CORP·Filed 2010·Granted Mar 1, 2011·15 cites·1 claims
- 0486US7217492B2Onium salt compound and radiation-sensitive resin compositionJSR CORP·Filed 2003·Granted May 15, 2007·17 cites·15 claims
- 0577US5031893ADevice for turning over printed sheetsKANZAKI PAPER MFG CO LTD·Filed 1989·Granted Jul 16, 1991·22 cites·4 claims
- 0674US9465295B2Pattern forming methodTOSHIBA KK·Filed 2014·Granted Oct 11, 2016·2 cites·8 claims
- 0766US6014418AFuel rod for light water reactor and method for manufacturing the sameMITSUBISHI MATERIALS CORP·Filed 1997·Granted Jan 11, 2000·14 cites·22 claims
- 0865US5374800AMethod for welding of fuel rodMITSUBISHI NUCLEAR FUEL·Filed 1993·Granted Dec 20, 1994·22 cites·20 claims
- 0963US9260300B2Pattern formation method and pattern formation apparatusTOSHIBA KK·Filed 2013·Granted Feb 16, 2016·1 cites·8 claims
- 1063US9209052B2Semiconductor manufacturing apparatus and device manufacturing method using substrate distortion correctionTOSHIBA KK·Filed 2013·Granted Dec 8, 2015·1 cites·10 claims
- 1163US8597867B2Lactone copolymer and radiation-sensitive resin compositionNAKASHIMA HIROMITSU·Filed 2005·Granted Dec 3, 2013·2 cites·19 claims
- 1259US9349585B2Pattern formation methodTOSHIBA KK·Filed 2014·Granted May 24, 2016·1 cites·16 claims
- 1358US2024105451A1Semiconductor substrate manufacturing method and compositionJSR CORP·Filed 2023·Application pending·0 cites
- 1453US10068915B2Manufacturing method for a semiconductor device including resist films different in thicknessTOSHIBA MEMORY CORP·Filed 2016·Granted Sep 4, 2018·0 cites·2 claims
- 1553US2024288773A1Method for manufacturing semiconductor substrate, and compositionJSR CORP·Filed 2024·Application pending·0 cites
- 1653US2024142876A1Semiconductor substrate manufacturing method and compositionJSR CORP·Filed 2023·Application pending·0 cites
- 1753US2025251666A1Resist underlayer film-forming composition, and method for manufacturing semiconductor substrateJSR CORP·Filed 2025·Application pending·0 cites
- 1853US2025110407A1Semiconductor substrate manufacturing method, and resist base film forming compositionJSR CORP·Filed 2024·Application pending·0 cites
- 1952US2024255852A1Method for manufacturing semiconductor substrate and compositionJSR CORP·Filed 2024·Application pending·0 cites
- 2050US5912935AFuel rod for light water reactor and method for manufacturing the sameMITSUBISHI MATERIALS CORP·Filed 1997·Granted Jun 15, 1999·16 cites·23 claims
- 2148US5401933AMethod for welding of end plug of control rodMITSUBISHI NUCLEAR FUEL·Filed 1993·Granted Mar 28, 1995·11 cites·8 claims
- 2248US2019002717A1Ink, textile printing method, printed textile and ink agent for textileJSR CORP·Filed 2018·Application pending·0 cites
- 2347US5968375AMethod for welding and apparatus thereforMITSUBISHI NUCLEAR FUEL·Filed 1997·Granted Oct 19, 1999·11 cites·7 claims
- 2446US2015116687A1Microprocessing system, microprocessing apparatus, and microprocessing methodTOSHIBA KK·Filed 2014·Application pending·0 cites
- 2545US5319178AWelding apparatus for fuel rod end plugsMITSUBISHI NUCLEAR FUEL·Filed 1992·Granted Jun 7, 1994·11 cites·15 claims
- 2645US2016260731A1Semiconductor device, manufacturing method for a semiconductor device, and nontransitory computer readable medium storing a pattern generating programTOSHIBA KK·Filed 2015·Application pending·0 cites
- 2744US2014251393A1Application liquid application apparatus and application liquid application methodTOSHIBA KK·Filed 2013·Application pending·0 cites
- 2843US2007042292A1Radiation sensitive resin compositionYONEDA EIJI·Filed 2006·Application pending·0 cites
- 2942US9348226B2Radiation-sensitive resin compositionNISHIMURA ISAO·Filed 2003·Granted May 24, 2016·2 cites·14 claims
- 3040US6824954B2Sulfonyloxime compound, and radiation sensitive acid generator, positive type radiation sensitive resin composition and negative type radiation sensitive resin composition using sameJSR CORP·Filed 2002·Granted Nov 30, 2004·4 cites·17 claims
- 3140US2014285787A1Exposure system and exposure methodTOSHIBA KK·Filed 2013·Application pending·0 cites
- 3239US2015253674A1Exposure apparatus, exposure method and manufacturing method of semiconductor deviceTOSHIBA KK·Filed 2014·Application pending·0 cites
- 3336US2017052460A1Mask container and mask container storing systemTOSHIBA KK·Filed 2015·Application pending·0 cites
- 3435US6272203B1X-ray fluorescence inspection apparatusMITSUBISHI NUCLEAR FUEL·Filed 1999·Granted Aug 7, 2001·4 cites·5 claims
- 3534US7314701B2Radiation-sensitive resin compositionJSR CORP·Filed 2003·Granted Jan 1, 2008·0 cites·12 claims
- 3628US6103996AMethod for producing a fuel rodMITSUBISHI NUCLEAR FUEL·Filed 1999·Granted Aug 15, 2000·5 cites·14 claims
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →