Inventor · disambiguated record
Sang-Hak Lim
Also filed as: LIM SANG HAK · LIM SANG HO
10 granted patents·7 pending applications·25 citations·filing 2002–2024
83Inventor score
Top patents by PatentIndex Score
17 records- 0185US8058711B2Filler for filling a gap and method for manufacturing semiconductor capacitor using the sameLIM SANG-HAK·Filed 2010·Granted Nov 15, 2011·10 cites·18 claims
- 0274US7629260B2Organosilane hardmask compositions and methods of producing semiconductor devices using the sameCHEIL IND INC·Filed 2006·Granted Dec 8, 2009·4 cites·11 claims
- 0372US9082612B2Composition for forming a silica layer, method of manufacturing the composition, silica layer prepared using the composition, and method of manufacturing the silica layerYUN HUI-CHAN·Filed 2011·Granted Jul 14, 2015·4 cites·13 claims
- 0472US8273519B2Hardmask composition and associated methodsKIM MI YOUNG·Filed 2007·Granted Sep 25, 2012·4 cites·10 claims
- 0571US9096726B2Composition for forming silica based insulating layer, method for manufacturing composition for forming silica based insulating layer, silica based insulating layer and method for manufacturing silica based insulating layerLIM SANG-HAK·Filed 2011·Granted Aug 4, 2015·3 cites·10 claims
- 0659US2025105768A1Motor control device and method for estimating position of rotor thereofHYUNDAI MOTOR CO LTD·Filed 2024·Application pending·0 cites
- 0750US9738787B2Composition for forming silica-based insulating layer, method for preparing composition for forming silica-based insulating layer, silica-based insulating layer, and method for manufacturing silica-based insulating layerCHEIL IND INC·Filed 2013·Granted Aug 22, 2017·0 cites·9 claims
- 0848US9890255B2Modified hydrogenated polysiloxazane, composition comprising same for forming silica-based insulation layer, method for preparing composition for formingCHEIL IND INC·Filed 2013·Granted Feb 13, 2018·0 cites·19 claims
- 0947US8916329B2Hardmask composition and associated methodsKIM SANG KYUN·Filed 2009·Granted Dec 23, 2014·0 cites·18 claims
- 1045US2015041959A1Hardmask composition for forming resist underlayer film, process for producing a semiconductor integrated circuit device, and semiconductor integrated circuit deviceSAMSUNG SDI CO LTD·Filed 2014·Application pending·0 cites
- 1143US2007212886A1Organosilane polymers, hardmask compositions including the same and methods of producing semiconductor devices using organosilane hardmask compositionsUH DONG SEON·Filed 2006·Application pending·0 cites
- 1241US8766411B2Filler for filling a gap, method of preparing the same and method of manufacturing semiconductor capacitor using the samePARK EUN-SU·Filed 2012·Granted Jul 1, 2014·0 cites·8 claims
- 1340US2014346391A1Polysiloxane hydroxide thin-film rinse solution, and polysilooxazine hydroxide thin-film pattern-forming method using the sameCHEIL IND INC·Filed 2012·Application pending·0 cites
- 1439US2010320573A1Organosilane polymers, hardmask compositions including the same and methods of producing semiconductor devices using organosilane hardmask compositionsUH DONG SEON·Filed 2010·Application pending·0 cites
- 1537US9240443B2Process of preparing a gap filler agent, a gap filler agent prepared using same, and a method for manufacturing semiconductor capacitor using the gap filler agentBAE JIN-HEE·Filed 2013·Granted Jan 19, 2016·0 cites·16 claims
- 1634US2003208901A1Design optimization of planar type write heads for ultra high density magnetic recordingFiled 2002·Application pending·0 cites
- 1734US2011241175A1Hardmask composition for forming resist underlayer film, process for producing a semiconductor integrated circuit device, and semiconductor integrated circuit deviceKOH SANG RAN·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →