Inventor · disambiguated record
Yuki Suka
Also filed as: SUKA YUKI
10 granted patents·3 pending applications·10 citations·filing 2011–2019
81Inventor score
Top patents by PatentIndex Score
13 records- 0187US10550136B2Method for producing polyalkylene glycol derivative having amino group at endSHINETSU CHEMICAL CO·Filed 2019·Granted Feb 4, 2020·1 cites·1 claims
- 0284US10472377B2Method for producing polyalkylene glycol derivative having amino group at end, polymerization initiator for use in the same, and alcohol compound as raw material for the polymerization initiatorSHINETSU CHEMICAL CO·Filed 2017·Granted Nov 12, 2019·1 cites·3 claims
- 0381US10836861B2Methods of preparing and purifying polyalkylene glycol derivativeSHINETSU CHEMICAL CO·Filed 2018·Granted Nov 17, 2020·1 cites·17 claims
- 0480US10377775B2Method for producing polyalkylene glycol derivative having amino group at endSHINETSU CHEMICAL CO·Filed 2015·Granted Aug 13, 2019·1 cites·16 claims
- 0579US9708350B2Method for producing polyalkylene glycol derivative having amino group at end, polymerization initiator for use in the same, and alcohol compound as raw material for the polymerization initiatorSHINETSU CHEMICAL CO·Filed 2015·Granted Jul 18, 2017·1 cites·21 claims
- 0678US11066430B2Method for producing polyalkylene glycol derivative having amino group at endSHINETSU CHEMICAL CO·Filed 2019·Granted Jul 20, 2021·0 cites·3 claims
- 0777US9040222B2Polymerizable tertiary ester compound, polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2013·Granted May 26, 2015·5 cites·16 claims
- 0849US10975042B2Method for purifying an amino acid-n-carboxy anhydrideSHINETSU CHEMICAL CO·Filed 2019·Granted Apr 13, 2021·0 cites·13 claims
- 0943US9284408B2Method for producing polyalkylene glycol derivative with narrow molecular weight distribution, and acetal group-containing alcohol compound for use therein and alkali metal salt thereofSHINETSU CHEMICAL CO·Filed 2015·Granted Mar 15, 2016·0 cites·11 claims
- 1042US2020102271A1Onium salt, resist composition, and pattern forming processSHINETSU CHEMICAL CO·Filed 2019·Application pending·0 cites
- 1140US2012214100A1Resist composition and patterning process using the sameKOBAYASHI TOMOHIRO·Filed 2012·Application pending·0 cites
- 1238US9187404B2Method for producing polyalkylene glycol derivative having amino group at end, with narrow molecular weight distributionSHINETSU CHEMICAL CO·Filed 2015·Granted Nov 17, 2015·0 cites·17 claims
- 1338US2011305979A1Resist top coat composition and patterning processHARADA YUJI·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →