Inventor · disambiguated record
Dominique Suhr
Also filed as: SUHR DOMINIQUE
9 granted patents·2 pending applications·13 citations·filing 2009–2022
79Inventor score
Top patents by PatentIndex Score
11 records- 0177US8883641B2Solution and method for activating the oxidized surface of a semiconductor substrateMEVELLEC VINCENT·Filed 2010·Granted Nov 11, 2014·5 cites·10 claims
- 0273US9190283B2Method of depositing metallic layers based on nickel or cobalt on a semiconducting solid substrate; kit for application of said methodMEVELLEC VINCENT·Filed 2012·Granted Nov 17, 2015·1 cites·20 claims
- 0372US8119542B2Method of preparing an electrically insulating film and application for the metallization of viasMEVELLEC VINCENT·Filed 2009·Granted Feb 21, 2012·4 cites·24 claims
- 0466US9368397B2Method for forming a vertical electrical connection in a layered semiconductor structureSUHR DOMINIQUE·Filed 2012·Granted Jun 14, 2016·3 cites·21 claims
- 0554US10472726B2Electrolyte and process for electroplating copper onto a barrier layerALCHIMER·Filed 2013·Granted Nov 12, 2019·0 cites·25 claims
- 0646US2024229235A9Electrolyte and Method for Cobalt ElectrodepositionAVENI·Filed 2022·Application pending·0 cites
- 0744US9564333B2Method for forming a metal silicide using a solution containing gold ions and fluorine ionsALCHIMER·Filed 2014·Granted Feb 7, 2017·0 cites·19 claims
- 0839US11384445B2Process for electrodeposition of cobaltAVENI·Filed 2019·Granted Jul 12, 2022·0 cites·14 claims
- 0935US9181623B2Solution and process for activating the surface of a semiconductor substrateMEVELLEC VINCENT·Filed 2010·Granted Nov 10, 2015·0 cites·21 claims
- 1034US10011914B2Copper electrodeposition bath containing an electrochemically inert cationALCHIMER·Filed 2014·Granted Jul 3, 2018·0 cites·10 claims
- 1132US2022090283A1Electrodeposition of a cobalt or copper alloy, and use in microelectronicsAVENI·Filed 2020·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Dominique Suhr files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →