Inventor · disambiguated record
Yoshiyuki Takata
Also filed as: TAKATA YOSHIYUKI
21 granted patents·7 pending applications·349 citations·filing 1994–2009
95Inventor score
Top patents by PatentIndex Score
28 records- 0197US7262321B2Salt suitable for an acid generator and a chemically amplified resist composition containing the sameSUMITOMO CHEMICAL CO·Filed 2006·Granted Aug 28, 2007·42 cites·25 claims
- 0295US7575850B2Chemically amplified resist compositionSUMITOMO CHEMICAL CO·Filed 2008·Granted Aug 18, 2009·26 cites·14 claims
- 0388US6475699B2Chemically amplified positive resist compositionSUMITOMO CHEMICAL CO·Filed 2001·Granted Nov 5, 2002·34 cites·7 claims
- 0483US7132218B2Chemically amplified positive resist compositionSUMITOMO CHEMICAL CO·Filed 2005·Granted Nov 7, 2006·7 cites·10 claims
- 0583US6579659B2Chemically amplified positive resist compositionFiled 2001·Granted Jun 17, 2003·63 cites·4 claims
- 0682US6835527B2Chemical amplifying type positive resist compositionSUMITOMO CHEMICAL CO·Filed 2002·Granted Dec 28, 2004·48 cites·8 claims
- 0779US7566522B2Chemically amplified resist compositionSUMITOMO CHEMICAL CO·Filed 2007·Granted Jul 28, 2009·6 cites·11 claims
- 0879US6495307B2Chemically amplified positive resist compositionSUMITOMO CHEMICAL CO·Filed 2001·Granted Dec 17, 2002·20 cites·3 claims
- 0973US7862980B2Salt suitable for an acid generator and a chemically amplified positive resist composition containing the sameSUMITOMO CHEMICAL CO·Filed 2007·Granted Jan 4, 2011·2 cites·21 claims
- 1073US6274287B1Positive resist compositions comprising a hydroxyphenyl ketoneSUMITOMO CHEMICAL CO·Filed 2000·Granted Aug 14, 2001·12 cites·7 claims
- 1172US6495306B2Chemically amplified positive resist compositionSUMITOMO CHEMICAL CO·Filed 2000·Granted Dec 17, 2002·30 cites·4 claims
- 1270US6537726B2Chemically amplified positive resist compositionSUMITOMO CHEMICAL CO·Filed 2001·Granted Mar 25, 2003·25 cites·2 claims
- 1366US7803513B2Chemically amplified resist compositionSUMITOMO CHEMICAL CO·Filed 2008·Granted Sep 28, 2010·2 cites·18 claims
- 1463US7572570B2Chemically amplified resist compositionSUMITOMO CHEMICAL CO·Filed 2008·Granted Aug 11, 2009·1 cites·13 claims
- 1551US7998656B2Chemically amplified positive resist compositionSUMITOMO CHEMICAL CO·Filed 2009·Granted Aug 16, 2011·0 cites·7 claims
- 1650US7175963B2Chemical amplification type positive resist composition and a resin thereforSUMITOMO CHEMICAL CO·Filed 2004·Granted Feb 13, 2007·9 cites·8 claims
- 1747US2008220369A1Chemically amplified resist compositionSUMITOMO CHEMICAL CO·Filed 2008·Application pending·0 cites
- 1846US7220532B2Chemical amplification type resist compositionSUMITOMO CHEMICAL CO·Filed 2003·Granted May 22, 2007·7 cites·15 claims
- 1946US2009156827A1Material for organic electroluminescent elements and organic electroluminescent elementTOYO INK MFG CO·Filed 2007·Application pending·0 cites
- 2041US5694262AMethod and apparatus for transferring data and making on-the-fly correction of errorsFUJITSU LTD·Filed 1995·Granted Dec 2, 1997·5 cites·6 claims
- 2141US5526201AMagnetic disk apparatusFUJITSU LTD·Filed 1994·Granted Jun 11, 1996·7 cites·10 claims
- 2241US2010279226A1Resist processing methodHATA MITSUHIRO·Filed 2008·Application pending·0 cites
- 2339US2001026905A1Positive resist compositionSUMITOMO CHEMICAL CO·Filed 2001·Application pending·0 cites
- 2436US2005031984A1Chemical amplification type positive resist compositionSUMITOMO CHEMICAL CO·Filed 2003·Application pending·0 cites
- 2535US2003180659A1Resist compositionFiled 2003·Application pending·0 cites
- 2634US2003068573A1Chemical amplification type positive resist compositionTAKATA YOSHIYUKI·Filed 2002·Application pending·0 cites
- 2733US5807656APolyhydroxy compound and a positive photoresist containing the sameSUMITOMO CHEMICAL CO·Filed 1996·Granted Sep 15, 1998·2 cites·7 claims
- 2832US6815140B2Positive resist compositionSUMITOMO CHEMICAL CO·Filed 1999·Granted Nov 9, 2004·1 cites·5 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →