Inventor · disambiguated record
Eric Scott Moyer
Also filed as: MOYER ERIC · MOYER ERIC S · MOYER ERIC SCOTT
41 granted patents·7 pending applications·1,673 citations·filing 1992–2024
98Inventor score
Top patents by PatentIndex Score
48 records- 0198US6576300B1High modulus, low dielectric constant coatingsDOW CORNING·Filed 2000·Granted Jun 10, 2003·588 cites·19 claims
- 0298US6558755B2Plasma curing process for porous silica thin filmDOW CORNING·Filed 2001·Granted May 6, 2003·563 cites·13 claims
- 0398US5426164APhotodefinable polymers containing perfluorocyclobutane groupsDOW CHEMICAL CO·Filed 1992·Granted Jun 20, 1995·104 cites·29 claims
- 0492US9976041B2UV-curable silicone compositions and anti-dust coating compositions containing sameDOW CORNING·Filed 2014·Granted May 22, 2018·7 cites·15 claims
- 0591US11807710B2UV-curable resins used for chemical mechanical polishing padsCMC MAT INC·Filed 2021·Granted Nov 7, 2023·1 cites·18 claims
- 0689US6281285B1Silicone resins and process for synthesisDOW CORNING·Filed 1999·Granted Aug 28, 2001·55 cites·20 claims
- 0789US5585450AOligomerized cyclobutarene resinsDOW CHEMICAL CO·Filed 1995·Granted Dec 17, 1996·46 cites·10 claims
- 0887US7756384B2Method for forming anti-reflective coatingDOW CORNING·Filed 2005·Granted Jul 13, 2010·9 cites·16 claims
- 0987US6231989B1Method of forming coatingsDOW CORNING·Filed 1998·Granted May 15, 2001·89 cites·18 claims
- 1086US8809482B2Silsesquioxane resinsFU PENG-FEI·Filed 2009·Granted Aug 19, 2014·7 cites·13 claims
- 1186US8377634B2Radiation sensitive silicone resin compositionDOW CORNING·Filed 2005·Granted Feb 19, 2013·8 cites·24 claims
- 1286US8304161B2Silsesquioxane resinsBRADFORD MICHAEL L·Filed 2009·Granted Nov 6, 2012·10 cites·48 claims
- 1385US8658284B2Polysilane—polysilazane copolymers and methods for their preparation and useCHEN WEI·Filed 2010·Granted Feb 25, 2014·5 cites·17 claims
- 1483US9023433B2Silsesquioxane resins and method of using them to form an antireflective coatingFU PENG-FEI·Filed 2008·Granted May 5, 2015·7 cites·7 claims
- 1583US8653217B2Method for forming anti-reflective coatingFU PENG-FEI·Filed 2011·Granted Feb 18, 2014·3 cites·4 claims
- 1682US8728335B2Method and materials for double patterningFU PENG-FEI·Filed 2010·Granted May 20, 2014·7 cites·18 claims
- 1782US8025927B2Method for forming anti-reflective coatingDOW CORNING·Filed 2005·Granted Sep 27, 2011·5 cites·15 claims
- 1882US6083661APhotodefineable cyclobutarene compositionsDOW CHEMICAL CO·Filed 1994·Granted Jul 4, 2000·36 cites·7 claims
- 1980US2024238937A1Chemical mechanical planarization pads with constant groove volumeCMC MAT LLC·Filed 2024·Application pending·0 cites
- 2078US8263312B2Antireflective coating materialFU PENG-FEI·Filed 2006·Granted Sep 11, 2012·5 cites·25 claims
- 2178US7368173B2Siloxane resin-based anti-reflective coating composition having high wet etch rateDOW CORNING·Filed 2004·Granted May 6, 2008·13 cites·18 claims
- 2277US7625687B2Silsesquioxane resinDOW CORNING·Filed 2004·Granted Dec 1, 2009·18 cites·61 claims
- 2375US8524439B2Silsesquioxane resin systems with base additives bearing electron-attracting functionalitiesHU SANLIN·Filed 2007·Granted Sep 3, 2013·3 cites·24 claims
- 2475US7833696B2Method for forming anti-reflective coatingDOW CORNING·Filed 2005·Granted Nov 16, 2010·5 cites·26 claims
- 2575US5489623APhotodefinable polymers containing perfluorocyclobutane groupsDOW CHEMICAL CO·Filed 1995·Granted Feb 6, 1996·15 cites·47 claims
- 2673US8088547B2Resist compositionHU SANLIN·Filed 2005·Granted Jan 3, 2012·4 cites·25 claims
- 2771US11938584B2Chemical mechanical planarization pads with constant groove volumeCABOT MICROELECTRONICS CORP·Filed 2020·Granted Mar 26, 2024·0 cites·10 claims
- 2870US11845157B2Chemical mechanical planarization pads via vat-based productionCABOT MICROELECTRONICS CORP·Filed 2020·Granted Dec 19, 2023·0 cites·8 claims
- 2969US9029269B2Wafer bonding system and method for bonding and debonding thereofBOURBINA MICHAEL·Filed 2012·Granted May 12, 2015·4 cites·20 claims
- 3069US6395825B1Process for synthesis of silicone resinDOW CORNING·Filed 2000·Granted May 28, 2002·8 cites·20 claims
- 3167US6759133B2High modulus, low dielectric constant coatingsDOW CORNING·Filed 2003·Granted Jul 6, 2004·8 cites·36 claims
- 3264US9086626B2Photo-patternable and developable silsesquioxane resins for use in device fabricationFU PENG-FEI·Filed 2012·Granted Jul 21, 2015·1 cites·9 claims
- 3362US5854302APartially polymerized divinylsiloxane linked bisbenzocyclobutene resins and methods for making said resinsDOW CHEMICAL CO·Filed 1994·Granted Dec 29, 1998·18 cites·6 claims
- 3457US8785113B2Method and materials for reverse patterningBRADFORD MICHAEL L·Filed 2010·Granted Jul 22, 2014·1 cites·16 claims
- 3556US8241707B2Silsesquioxane resinsFU PENG-FEI·Filed 2009·Granted Aug 14, 2012·0 cites·34 claims
- 3654US2016289388A1Silicate Resins And Methods Of Preparing SameDOW CORNING·Filed 2014·Application pending·0 cites
- 3753US8507179B2Switchable antireflective coatingsFU PENG-FEI·Filed 2009·Granted Aug 13, 2013·0 cites·12 claims
- 3853US8148043B2Silsesquioxane resin systems with base additives bearing electron-attracting functionalitiesHU SANLIN·Filed 2007·Granted Apr 3, 2012·5 cites·25 claims
- 3948US5882836APhotocurable formulation containing a partially polymerized divinylsiloxane linked bisbenzocyclobutene resinDOW CHEMICAL CO·Filed 1995·Granted Mar 16, 1999·11 cites·6 claims
- 4042US2009032901A1Method of curing hydrogen silsesquioxane and densification in nano-scale trenchesCHEN WEI·Filed 2006·Application pending·0 cites
- 4141US2003175535A1Plasma curing process for porous silica thin filmFiled 2003·Application pending·0 cites
- 4239US2014051804A1Polysilanesiloxane resins for use in an antireflective coatingZHOU XIAOBING·Filed 2012·Application pending·0 cites
- 4339US2014342292A1Di-t-butoxydiacetoxysilane-based silsesquioxane resins as hard-mask antireflective coating material and method of makingDOW CORNING·Filed 2013·Application pending·0 cites
- 4438US8828252B2Method and materials for reverse patterningBRADFORD MICHAEL L·Filed 2010·Granted Sep 9, 2014·0 cites·14 claims
- 4538US2013189495A1Nanoscale PhotolithographyFU PENG-FEI·Filed 2011·Application pending·0 cites
- 4635US5464925ABenzocyclobutene-terminated polymidesDOW CHEMICAL CO·Filed 1994·Granted Nov 7, 1995·4 cites·11 claims
- 4733US8648125B2Stabilization of silsesquioxane resinsMACMILLAN ANDREW·Filed 2010·Granted Feb 11, 2014·0 cites·4 claims
- 4826US6727038B1Photodefineable compositionsDOW GLOBAL TECHNOLOGIES INC·Filed 2001·Granted Apr 27, 2004·0 cites·6 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →