Inventor · disambiguated record
Yuichi Kamori
Also filed as: KAMORI YUICHI
8 granted patents·2 pending applications·0 citations·filing 2009–2019
72Inventor score
Top patents by PatentIndex Score
10 records- 0169US9419214B2Target, method for producing the same, memory, and method for producing the sameSONY CORP·Filed 2014·Granted Aug 16, 2016·0 cites·5 claims
- 0268US11827971B2Sputtering targetDEXERIALS CORP·Filed 2019·Granted Nov 28, 2023·0 cites·9 claims
- 0368US10069066B2Target, method for producing the same, memory, and method for producing the sameSONY SEMICONDUCTOR SOLUTIONS CORP·Filed 2016·Granted Sep 4, 2018·0 cites·1 claims
- 0457US2011027597A1Target, method for producing the same, memory, and method for producing the sameSONY CORP·Filed 2010·Application pending·0 cites
- 0556US11225709B2Mn—Zn—O sputtering target and production method thereforDEXERIALS CORP·Filed 2017·Granted Jan 18, 2022·0 cites·3 claims
- 0654US12293906B2Mn—Ta—W—Cu—O-based sputtering target, and production method thereforDEXERIALS CORP·Filed 2019·Granted May 6, 2025·0 cites·8 claims
- 0750US2021358728A1Mn-Nb-W-Cu-O-BASED SPUTTERING TARGET, AND PRODUCTION METHOD THEREFORDEXERIALS CORP·Filed 2019·Application pending·0 cites
- 0849US8182722B2Methods for manufacturing zinc oxide base sputtering target and transparent electrically conductive filmKIRITA SHINA·Filed 2009·Granted May 22, 2012·0 cites·17 claims
- 0943US10886112B2Mn—Zn—W—O sputtering target and production method thereforDEXERIALS CORP·Filed 2016·Granted Jan 5, 2021·0 cites·6 claims
- 1041US10811237B2Mn—Zn—O sputtering target and production method thereforDEXERIALS CORP·Filed 2016·Granted Oct 20, 2020·0 cites·4 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →