Inventor · disambiguated record
Sung Pyo Lee
Also filed as: LEE SUNG PYO
8 granted patents·5 pending applications·5 citations·filing 2013–2022
75Inventor score
Top patents by PatentIndex Score
13 records- 0177US9318647B2Method of manufacturing semiconductor light emitting deviceSAMSUNG ELECTRONICS CO LTD·Filed 2014·Granted Apr 19, 2016·4 cites·16 claims
- 0262US10494547B2Additive composition and positive polishing slurry composition including the sameKCTECH CO LTD·Filed 2016·Granted Dec 3, 2019·1 cites·9 claims
- 0353US11279852B2CMP slurry compositions and methods of fabricating a semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2020·Granted Mar 22, 2022·0 cites·16 claims
- 0453US9209064B2Apparatus for transferring substratesTES CO LTD·Filed 2014·Granted Dec 8, 2015·0 cites·12 claims
- 0553US9209063B2Apparatus for transferring substratesTES CO LTD·Filed 2014·Granted Dec 8, 2015·0 cites·4 claims
- 0651US9142442B2Apparatus for transferring substratesTES CO LTD·Filed 2013·Granted Sep 22, 2015·0 cites·13 claims
- 0749US2023136640A1Polishing slurry compositionKCTECH CO LTD·Filed 2022·Application pending·0 cites
- 0847US2020071566A1Slurry composition for chemical mechanical polishingSAMSUNG ELECTRONICS CO LTD·Filed 2019·Application pending·0 cites
- 0944US2023065440A1Method and apparatus for managing applicationSAMSUNG SDS CO LTD·Filed 2022·Application pending·0 cites
- 1041US10138395B2Abrasive particle-dispersion layer composite and polishing slurry composition including the sameK C TECH CO LTD·Filed 2016·Granted Nov 27, 2018·0 cites·15 claims
- 1141US2019240628A1Apparatus and method for producing hydrogen water having antioxidant and fine dust accumulation inhibiting functions, and hydrogen water produced using the sameLEE SUNG PYO·Filed 2017·Application pending·0 cites
- 1234US2018362806A1Chemical mechanical polishing slurry composition and method of fabricating semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2017·Application pending·0 cites
- 1333US10421883B2Abrasive particle-dispersion layer composite and polishing slurry composition including the sameKCTECH CO LTD·Filed 2016·Granted Sep 24, 2019·0 cites·14 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →