Inventor · disambiguated record
Tetsuji Yasuda
Also filed as: YASUDA TETSUJI
13 granted patents·11 pending applications·53 citations·filing 1999–2016
89Inventor score
Top patents by PatentIndex Score
24 records- 0174US7372112B2Semiconductor device, process for producing the same and process for producing metal compound thin filmROHM CO LTD·Filed 2005·Granted May 13, 2008·5 cites·4 claims
- 0273US7387686B2Film formation apparatusROHM CO LTD·Filed 2004·Granted Jun 17, 2008·16 cites·9 claims
- 0368US7790627B2Semiconductor device, method of manufacturing the same, and method of manufacturing metal compound thin filmROHM CO LTD·Filed 2007·Granted Sep 7, 2010·3 cites·5 claims
- 0463US9184240B2Method of producing semiconductor wafer, and semiconductor waferSUMITOMO CHEMICAL CO·Filed 2013·Granted Nov 10, 2015·1 cites·8 claims
- 0563US9112035B2Semiconductor substrate, field-effect transistor, integrated circuit, and method for fabricating semiconductor substrateYAMADA HISASHI·Filed 2012·Granted Aug 18, 2015·2 cites·10 claims
- 0661US8901656B2Semiconductor wafer, field-effect transistor, method of producing semiconductor wafer, and method of producing field-effect transistorSUMITOMO CHEMICAL CO·Filed 2013·Granted Dec 2, 2014·1 cites·9 claims
- 0759US6596186B2Mask for the selective growth of a solid, a manufacturing method for the mask, and a method for selectively growing a solid using the maskSAMSUNG ELECTRONICS CO LTD·Filed 2001·Granted Jul 22, 2003·6 cites·15 claims
- 0853US6747748B2Manufacturing method for a field-effect transistor, manufacturing method for a semiconductor device, and apparatus thereforTOKYO ELECTRON LTD·Filed 2001·Granted Jun 8, 2004·6 cites·10 claims
- 0948US7101811B2Method for forming a dielectric layer and related devicesINTEL CORP·Filed 2003·Granted Sep 5, 2006·3 cites·29 claims
- 1046US7511321B2Method for forming a dielectric layer and related devicesINTEL CORP·Filed 2006·Granted Mar 31, 2009·0 cites·20 claims
- 1145US2015155165A1Method of producing composite wafer and composite waferSUMITOMO CHEMICAL CO·Filed 2014·Application pending·0 cites
- 1245US2008026148A1Film Forming System And Method For Forming FilmTOMINAGA KOJI·Filed 2004·Application pending·0 cites
- 1344US2015137317A1Semiconductor wafer, method of producing a semiconductor wafer and method of producing a composite waferSUMITOMO CHEMICAL CO·Filed 2014·Application pending·0 cites
- 1444US2015137318A1Semiconductor wafer, method of producing a semiconductor wafer and method of producing a composite waferSUMITOMO CHEMICAL CO·Filed 2014·Application pending·0 cites
- 1543US6287699B1Mask for the selective growth of a solidSAMSUNG ELECTRONICS CO LTD·Filed 1999·Granted Sep 11, 2001·10 cites·7 claims
- 1643US2014203408A1Method of producing composite wafer and composite waferNAT INST OF ADVANCED IND SCIEN·Filed 2014·Application pending·0 cites
- 1743US2014091393A1Semiconductor device, semiconductor wafer, method for producing semiconductor wafer, and method for producing semiconductor deviceSUMITOMO CHEMICAL CO·Filed 2013·Application pending·0 cites
- 1843US2014091398A1Semiconductor device, semiconductor wafer, method for producing semiconductor wafer, and method for producing semiconductor deviceSUMITOMO CHEMICAL CO·Filed 2013·Application pending·0 cites
- 1943US2011233689A1Semiconductor device, process for producing semiconductor device, semiconductor substrate, and process for producing semiconductor substrateSUMITOMO CHEMICAL CO·Filed 2009·Application pending·0 cites
- 2042US2014091392A1Semiconductor device, semiconductor wafer, method for producing semiconductor wafer, and method for producing semiconductor deviceSUMITOMO CHEMICAL CO·Filed 2013·Application pending·0 cites
- 2139US8779471B2Field-effect transistor, semiconductor wafer, method for producing field-effect transistor and method for producing semiconductor waferHATA MASAHIKO·Filed 2012·Granted Jul 15, 2014·0 cites·22 claims
- 2238US10636751B2Semiconductor device including circuit having security functionAIST·Filed 2016·Granted Apr 28, 2020·0 cites·16 claims
- 2333US2007077776A1Method for forming an insulating film in a semiconductor deviceKOJI TOMINAGA·Filed 2004·Application pending·0 cites
- 2430US2004198029A1Process for producing thin oxide film and production apparatusFiled 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →