Inventor · disambiguated record
Haruyoshi Osaki
Also filed as: OSAKI HARUYOSHI
20 granted patents·202 citations·filing 1987–1998
95Inventor score
Files withSUMITOMO CHEMICAL CO20
Top patents by PatentIndex Score
20 records- 0192US4812551ANovolak resin for positive photoresistSUMITOMO CHEMICAL CO·Filed 1987·Granted Mar 14, 1989·56 cites·5 claims
- 0278US5468590APositive resist compositionSUMITOMO CHEMICAL CO·Filed 1994·Granted Nov 21, 1995·24 cites·16 claims
- 0369US5726217ATetraphenol compounds and process for producing the sameSUMITOMO CHEMICAL CO·Filed 1996·Granted Mar 10, 1998·10 cites·8 claims
- 0467US5792585ARadiation-sensitive positive resist compositionSUMITOMO CHEMICAL CO·Filed 1994·Granted Aug 11, 1998·7 cites·6 claims
- 0567US5429904APositive resist compositionSUMITOMO CHEMICAL CO·Filed 1993·Granted Jul 4, 1995·21 cites·17 claims
- 0661US5866724APositive resist composition and photosensitizersSUMITOMO CHEMICAL CO·Filed 1996·Granted Feb 2, 1999·19 cites·6 claims
- 0751US5188920APositive resist composition containing 1,2-quinone diazide compound, alkali-soluble resin and polyhydroxy phenol additive compoundSUMITOMO CHEMICAL CO·Filed 1991·Granted Feb 23, 1993·10 cites·10 claims
- 0849US5736292ARadiation-sensitive positive resist composition comprising an alkali soluble resin made from m-cresol, 2,3,5-trimethyl phenol and optionally p-cresol and a polyphenol compound having alkyl or alkoxy side groupsSUMITOMO CHEMICAL CO·Filed 1995·Granted Apr 7, 1998·9 cites·1 claims
- 0948US5326665APositive type resist compositionSUMITOMO CHEMICAL CO·Filed 1993·Granted Jul 5, 1994·6 cites·20 claims
- 1047US5451484APositive resist compositionSUMITOMO CHEMICAL CO·Filed 1993·Granted Sep 19, 1995·9 cites·16 claims
- 1145US5861229ARadiation-sensitive positive resist composition comprising a 1,2-quinone diazide compound, an alkali-soluble resin and a polyphenol compoundSUMITOMO CHEMICAL CO·Filed 1992·Granted Jan 19, 1999·7 cites·3 claims
- 1244US5965748ASuccinimide derivative, process for production and use thereofSUMITOMO CHEMICAL CO·Filed 1998·Granted Oct 12, 1999·2 cites·6 claims
- 1344US5395727APositive resist composition containing a novolak resin made from an aldehyde and dimer of isopropenyl phenolSUMITOMO CHEMICAL CO·Filed 1993·Granted Mar 7, 1995·5 cites·10 claims
- 1440US5336583APositive quinonediazide resist composition utilizing mixed solvent of ethyl lactate and 2-heptanoneSUMITOMO CHEMICAL CO·Filed 1993·Granted Aug 9, 1994·5 cites·3 claims
- 1540US5288587ARadiation-sensitive positive resist composition comprising an o-quinone diazide, an alkali-soluble resin and a polyphenol compoundSUMITOMO CHEMICAL CO·Filed 1993·Granted Feb 22, 1994·5 cites·5 claims
- 1634US5792586APositive resist composition comprising a novolac resin made from a cycloalkyl substituted phenolSUMITOMO CHEMICAL CO·Filed 1994·Granted Aug 11, 1998·1 cites·21 claims
- 1733US5807656APolyhydroxy compound and a positive photoresist containing the sameSUMITOMO CHEMICAL CO·Filed 1996·Granted Sep 15, 1998·2 cites·7 claims
- 1831US6383708B1Positive resist compositionSUMITOMO CHEMICAL CO·Filed 1993·Granted May 7, 2002·1 cites·5 claims
- 1931US5783355ARadiation-sensitive positive resist compositionSUMITOMO CHEMICAL CO·Filed 1995·Granted Jul 21, 1998·1 cites·11 claims
- 2030US5843616APositive resist compositionSUMITOMO CHEMICAL CO·Filed 1995·Granted Dec 1, 1998·2 cites·13 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →