Inventor · disambiguated record
Toshiaki Shinozaki
Also filed as: SHINOZAKI TOSHIAKI
13 granted patents·196 citations·filing 1978–1991
93Inventor score
Top patents by PatentIndex Score
13 records- 0180US4572956AElectron beam pattern transfer system having an autofocusing mechanismTOKYO SHIBAURA ELECTRIC CO·Filed 1983·Granted Feb 25, 1986·21 cites·18 claims
- 0271US4218621AElectron beam exposure apparatusVLSI TECHNOLOGY RES ASS·Filed 1978·Granted Aug 19, 1980·12 cites·13 claims
- 0369US4748327AMethod of inspecting masks and apparatus thereofTOSHIBA KK·Filed 1986·Granted May 31, 1988·37 cites·15 claims
- 0463US4717645AMethod and apparatus for forming resist patternTOKYO SHIBAURA ELECTRIC CO·Filed 1985·Granted Jan 5, 1988·26 cites·15 claims
- 0560US4411013ASystem for transferring a fine pattern onto a targetTOKYO SHIBAURA ELECTRIC CO·Filed 1981·Granted Oct 18, 1983·23 cites·5 claims
- 0658US4469949AElectron beam pattern transfer device and method for aligning mask and semiconductor waferTOSHIBA KK·Filed 1982·Granted Sep 4, 1984·21 cites·12 claims
- 0751US5051338AMethod and apparatus for forming resist patternTOKYO SHIBAURA ELECTRIC CO·Filed 1989·Granted Sep 24, 1991·16 cites·6 claims
- 0846US4269653AAperture stopVLSI TECHNOLOGY RES ASS·Filed 1979·Granted May 26, 1981·6 cites·4 claims
- 0944US4897337AMethod and apparatus for forming resist patternTOKYO SHIBAURA ELECTRIC CO·Filed 1987·Granted Jan 30, 1990·7 cites·6 claims
- 1041US5188924APattern forming method utilizing material with photoresist film underlayer and contrast enhancement overlayer containing photosensitive diazonium saltTOSHIBA KK·Filed 1991·Granted Feb 23, 1993·6 cites·21 claims
- 1140US4467210AElectron-beam image transfer deviceTOKYO SHIBAURA ELECTRIC CO·Filed 1982·Granted Aug 21, 1984·9 cites·6 claims
- 1237US4366383AElectron beam type pattern transfer apparatusVLSI TECHNOLOGY RES ASS·Filed 1980·Granted Dec 28, 1982·8 cites·2 claims
- 1335US4560278AFixed-slit type photoelectric microscopeTOKYO SHIBAURA ELECTRIC CO·Filed 1983·Granted Dec 24, 1985·4 cites·18 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →