Inventor · disambiguated record
Matthew J. Goeckner
Also filed as: GOECKNER MATTHEW · GOECKNER MATTHEW J
9 granted patents·1 pending application·618 citations·filing 1998–2009
92Inventor score
Top patents by PatentIndex Score
10 records- 0196US6020592ADose monitor for plasma doping systemVARIAN SEMICONDUCTOR EQUIPMENT·Filed 1998·Granted Feb 1, 2000·155 cites·40 claims
- 0295US6335536B1Method and apparatus for low voltage plasma doping using dual pulsesVARIAN SEMICONDUCTOR EQUIPMENT·Filed 1999·Granted Jan 1, 2002·101 cites·7 claims
- 0395US6182604B1Hollow cathode for plasma doping systemVARIAN SEMICONDUCTOR EQUIPMENT·Filed 1999·Granted Feb 6, 2001·133 cites·12 claims
- 0491US6300643B1Dose monitor for plasma doping systemVARIAN SEMICONDUCTOR EQUIPMENT·Filed 1999·Granted Oct 9, 2001·60 cites·23 claims
- 0589US6433553B1Method and apparatus for eliminating displacement current from current measurements in a plasma processing systemVARIAN SEMICONDUCTOR EQUIPMENT·Filed 1999·Granted Aug 13, 2002·85 cites·34 claims
- 0688US9997325B2Electron beam exciter for use in chemical analysis in processing systemsHOSCH JIMMY W·Filed 2009·Granted Jun 12, 2018·24 cites·9 claims
- 0787US6527918B2Method and apparatus for low voltage plasma doping using dual pulsesVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2001·Granted Mar 4, 2003·23 cites·18 claims
- 0885US6528805B2Dose monitor for plasma doping systemVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2001·Granted Mar 4, 2003·17 cites·6 claims
- 0982US6500496B1Hollow cathode for plasma doping systemVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2000·Granted Dec 31, 2002·20 cites·14 claims
- 1040US2002030167A1Dose monitor for plasma doping systemFiled 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →