Inventor · disambiguated record
Erik Marie Jose Smeets
Also filed as: SMEETS ERIK MARIE JOSE
8 granted patents·2 pending applications·123 citations·filing 2003–2012
84Inventor score
Technology areasG03F
Top patents by PatentIndex Score
10 records- 0195US7359030B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2003·Granted Apr 15, 2008·92 cites·19 claims
- 0289US8194242B2Substrate distortion measurementDERKSEN ANTONIUS THEODORUS ANNA MARIA·Filed 2005·Granted Jun 5, 2012·15 cites·18 claims
- 0384US7777863B2Lithographic apparatus with mask to prevent exposure of peripheral exposure region of substrateASML NETHERLANDS BV·Filed 2007·Granted Aug 17, 2010·10 cites·11 claims
- 0470US8139218B2Substrate distortion measurementSMEETS ERIK MARIE JOSE·Filed 2005·Granted Mar 20, 2012·3 cites·21 claims
- 0565US7936447B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted May 3, 2011·2 cites·8 claims
- 0659US7808612B2Lithographic apparatus and method for masking a substrateASML NETHERLANDS BV·Filed 2007·Granted Oct 5, 2010·1 cites·5 claims
- 0750US9645512B2Substrate distortion measurementSMEETS ERIK MARIE JOSE·Filed 2012·Granted May 9, 2017·0 cites·15 claims
- 0839US2008055577A1Lithographic apparatus and methodASML NETHERLANDS BV·Filed 2006·Application pending·0 cites
- 0937US7398177B2Measurement substrate, substrate table, lithographic apparatus, method of calculating an angle of an alignment beam of an alignment system, and alignment verification methodASML NETHERLANDS BV·Filed 2004·Granted Jul 8, 2008·0 cites·9 claims
- 1034US2010265487A1Lithographic apparatus, positioning system, and positioning methodASML NETHERLANDS BV·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →