Inventor · disambiguated record
Yoshikazu Kasuya
Also filed as: KASUYA YOSHIKAZU
30 granted patents·2 pending applications·289 citations·filing 1999–2020
97Inventor score
Top patents by PatentIndex Score
32 records- 0194US8637950B2Semiconductor device, method for manufacturing the same, method for generating mask data, mask and computer readable recording mediumSEIKO EPSON CORP·Filed 2013·Granted Jan 28, 2014·9 cites·4 claims
- 0294US7802224B2Semiconductor device, method for manufacturing the same, method for generating mask data, mask and computer readable recording mediumSEIKO EPSON CORP·Filed 2007·Granted Sep 21, 2010·16 cites·10 claims
- 0392US7977233B2Semiconductor device, method for manufacturing the same, method for generating mask data, mask and computer readable recording mediumSEIKO EPSON CORP·Filed 2010·Granted Jul 12, 2011·7 cites·12 claims
- 0491US8214776B2Semiconductor device, method for manufacturing the same, method for generating mask data, mask and computer readable recording mediumMORI KATSUMI·Filed 2011·Granted Jul 3, 2012·9 cites·6 claims
- 0590US9455223B2Semiconductor device, method for manufacturing the same, method for generating mask data, mask and computer readable recording mediumSEIKO EPSON CORP·Filed 2015·Granted Sep 27, 2016·4 cites·14 claims
- 0689US10121741B2Semiconductor device, method for manufacturing the same, method for generating mask data, mask and computer readable recording mediumSEIKO EPSON CORP·Filed 2017·Granted Nov 6, 2018·3 cites·13 claims
- 0788US8984466B2Semiconductor device, method for manufacturing the same, method for generating mask data, mask and computer readable recording mediumSEIKO EPSON CORP·Filed 2013·Granted Mar 17, 2015·4 cites·5 claims
- 0883US6798015B2Semiconductor device and method of manufacturing the sameSEIKO EPSON CORP·Filed 2003·Granted Sep 28, 2004·32 cites·6 claims
- 0982US10679979B2Semiconductor deviceSEIKO EPSON CORP·Filed 2018·Granted Jun 9, 2020·1 cites·12 claims
- 1082US6437455B2Semiconductor device having gate-gate, drain-drain, and drain-gate connecting layers and method of fabricating the sameSEIKO EPSON CORP·Filed 2001·Granted Aug 20, 2002·24 cites·21 claims
- 1178US7015542B2MONOS memory deviceSEIKO EPSON CORP·Filed 2003·Granted Mar 21, 2006·24 cites·3 claims
- 1277US8418114B2Semiconductor device, method for manufacturing the same, method for generating mask data, mask and computer readable recording mediumMORI KATSUMI·Filed 2012·Granted Apr 9, 2013·2 cites·2 claims
- 1376US6664155B2Method of manufacturing semiconductor device with memory area and logic circuit areaSEIKO EPSON CORP·Filed 2003·Granted Dec 16, 2003·16 cites·2 claims
- 1475US10930635B2Semiconductor deviceSEIKO EPSON CORP·Filed 2020·Granted Feb 23, 2021·0 cites·18 claims
- 1575US6706579B2Method of manufacturing semiconductor deviceSEIKO EPSON CORP·Filed 2003·Granted Mar 16, 2004·16 cites·2 claims
- 1675US6404023B1Semiconductor device having gate-gate, drain-drain, and drain-gate connecting layers and method of fabricating the sameSEIKO EPSON CORP·Filed 2001·Granted Jun 11, 2002·33 cites·24 claims
- 1773US6560765B2Method for generating mask data, mask and computer readable recording mediaSEIKO EPSON CORP·Filed 2001·Granted May 6, 2003·15 cites·26 claims
- 1872US6888250B2Semiconductor device, method for manufacturing the same, method for generating mask data, mask and computer readable recording mediumSEIKO EPSON CORP·Filed 2001·Granted May 3, 2005·9 cites·28 claims
- 1971US6605852B2Semiconductor device and method for manufacturing the same including forming a plurality of dummy convex regions on a matrix with a virtual linear line defining an angleSEIKO EPSON CORP·Filed 2001·Granted Aug 12, 2003·18 cites·45 claims
- 2068US7271490B2Semiconductor device having dummy wiring layers and a method for manufacturing the sameSEIKO EPSON CORP·Filed 2004·Granted Sep 18, 2007·6 cites·9 claims
- 2165US6753215B2Methods for manufacturing semiconductor devices and semiconductor devicesSEIKO EPSON CORP·Filed 2001·Granted Jun 22, 2004·13 cites·18 claims
- 2263US9978737B2Semiconductor device, method for manufacturing the same, method for generating mask data, mask and computer readable recording mediumSEIKO EPSON CORP·Filed 2016·Granted May 22, 2018·0 cites·12 claims
- 2363US9953922B2Semiconductor device, method for manufacturing the same, method for generating mask data, mask and computer readable recording mediumSEIKO EPSON CORP·Filed 2017·Granted Apr 24, 2018·0 cites·12 claims
- 2456US6784078B2Methods for manufacturing semiconductor devices and semiconductor devicesSEIKO EPSON CORP·Filed 2001·Granted Aug 31, 2004·7 cites·25 claims
- 2550US6953967B2Semiconductor device and method of manufacturing the sameSEIKO EPSON CORP·Filed 2003·Granted Oct 11, 2005·4 cites·5 claims
- 2650US6762102B2Methods for manufacturing semiconductor devices and semiconductor devicesSEIKO EPSON CORP·Filed 2001·Granted Jul 13, 2004·4 cites·23 claims
- 2749US7484280B2Method for manufacturing a surface acoustic wave element having an interdigital transducer (IDT) electrodeSEIKO EPSON CORP·Filed 2007·Granted Feb 3, 2009·1 cites·8 claims
- 2847US6930000B2Method of manufacturing semiconductor deviceSEIKO EPSON CORP·Filed 2003·Granted Aug 16, 2005·3 cites·2 claims
- 2942US6815291B2Method of manufacturing semiconductor deviceSEIKO EPSON CORP·Filed 2003·Granted Nov 9, 2004·1 cites·4 claims
- 3040US6528414B1Methods for forming wiring line structures in semiconductor devicesSEIKO EPSON CORP·Filed 1999·Granted Mar 4, 2003·8 cites·3 claims
- 3139US2005112825A1Method for manufacturing a semiconductor deviceFiled 2004·Application pending·0 cites
- 3236US2004135196A1Semiconductor device and method of manufacturing the sameSEIKO EPSON CORP·Filed 2003·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Yoshikazu Kasuya files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →