Inventor · disambiguated record
Kei Kawahara
Also filed as: KAWAHARA KEI
18 granted patents·5 pending applications·160 citations·filing 2001–2022
95Inventor score
Top patents by PatentIndex Score
23 records- 0194US8637950B2Semiconductor device, method for manufacturing the same, method for generating mask data, mask and computer readable recording mediumSEIKO EPSON CORP·Filed 2013·Granted Jan 28, 2014·9 cites·4 claims
- 0294US7802224B2Semiconductor device, method for manufacturing the same, method for generating mask data, mask and computer readable recording mediumSEIKO EPSON CORP·Filed 2007·Granted Sep 21, 2010·16 cites·10 claims
- 0392US7977233B2Semiconductor device, method for manufacturing the same, method for generating mask data, mask and computer readable recording mediumSEIKO EPSON CORP·Filed 2010·Granted Jul 12, 2011·7 cites·12 claims
- 0491US8214776B2Semiconductor device, method for manufacturing the same, method for generating mask data, mask and computer readable recording mediumMORI KATSUMI·Filed 2011·Granted Jul 3, 2012·9 cites·6 claims
- 0590US9455223B2Semiconductor device, method for manufacturing the same, method for generating mask data, mask and computer readable recording mediumSEIKO EPSON CORP·Filed 2015·Granted Sep 27, 2016·4 cites·14 claims
- 0689US10121741B2Semiconductor device, method for manufacturing the same, method for generating mask data, mask and computer readable recording mediumSEIKO EPSON CORP·Filed 2017·Granted Nov 6, 2018·3 cites·13 claims
- 0788US8984466B2Semiconductor device, method for manufacturing the same, method for generating mask data, mask and computer readable recording mediumSEIKO EPSON CORP·Filed 2013·Granted Mar 17, 2015·4 cites·5 claims
- 0882US10679979B2Semiconductor deviceSEIKO EPSON CORP·Filed 2018·Granted Jun 9, 2020·1 cites·12 claims
- 0982US6437455B2Semiconductor device having gate-gate, drain-drain, and drain-gate connecting layers and method of fabricating the sameSEIKO EPSON CORP·Filed 2001·Granted Aug 20, 2002·24 cites·21 claims
- 1077US8418114B2Semiconductor device, method for manufacturing the same, method for generating mask data, mask and computer readable recording mediumMORI KATSUMI·Filed 2012·Granted Apr 9, 2013·2 cites·2 claims
- 1175US10930635B2Semiconductor deviceSEIKO EPSON CORP·Filed 2020·Granted Feb 23, 2021·0 cites·18 claims
- 1275US6404023B1Semiconductor device having gate-gate, drain-drain, and drain-gate connecting layers and method of fabricating the sameSEIKO EPSON CORP·Filed 2001·Granted Jun 11, 2002·33 cites·24 claims
- 1373US6560765B2Method for generating mask data, mask and computer readable recording mediaSEIKO EPSON CORP·Filed 2001·Granted May 6, 2003·15 cites·26 claims
- 1472US6888250B2Semiconductor device, method for manufacturing the same, method for generating mask data, mask and computer readable recording mediumSEIKO EPSON CORP·Filed 2001·Granted May 3, 2005·9 cites·28 claims
- 1571US6605852B2Semiconductor device and method for manufacturing the same including forming a plurality of dummy convex regions on a matrix with a virtual linear line defining an angleSEIKO EPSON CORP·Filed 2001·Granted Aug 12, 2003·18 cites·45 claims
- 1668US7271490B2Semiconductor device having dummy wiring layers and a method for manufacturing the sameSEIKO EPSON CORP·Filed 2004·Granted Sep 18, 2007·6 cites·9 claims
- 1765US2024297343A1Nonaqueous electrolyte solution, nonaqueous sodium ion battery, nonaqueous potassium ion battery, method for producing nonaqueous sodium ion battery, and method for producing nonaqueous potassium ion batteryCENTRAL GLASS CO LTD·Filed 2022·Application pending·0 cites
- 1865US2024258574A1Electrolyte solution for nonaqueous sodium ion battery, nonaqueous sodium ion battery, and method for producing the sameCENTRAL GLASS CO LTD·Filed 2022·Application pending·0 cites
- 1965US2024274879A1Electrolyte solution for nonaqueous sodium ion battery, nonaqueous sodium ion battery, and method for producing nonaqueous sodium ion batteryCENTRAL GLASS CO LTD·Filed 2022·Application pending·0 cites
- 2063US9978737B2Semiconductor device, method for manufacturing the same, method for generating mask data, mask and computer readable recording mediumSEIKO EPSON CORP·Filed 2016·Granted May 22, 2018·0 cites·12 claims
- 2163US9953922B2Semiconductor device, method for manufacturing the same, method for generating mask data, mask and computer readable recording mediumSEIKO EPSON CORP·Filed 2017·Granted Apr 24, 2018·0 cites·12 claims
- 2254US2022278368A1Nonaqueous electrolyte solution and nonaqueous electrolyte solution secondary batteryCENTRAL GLASS CO LTD·Filed 2020·Application pending·0 cites
- 2346US2021313624A1Nonaqueous electrolyte solution and nonaqueous electrolyte secondary batteryCENTRAL GLASS CO LTD·Filed 2019·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →