Inventor · disambiguated record
Naonori Fujiwara
Also filed as: FUJIWARA NAONORI
4 granted patents·10 pending applications·10 citations·filing 2006–2025
64Inventor score
Top patents by PatentIndex Score
14 records- 0184US8574998B2Leakage reduction in DRAM MIM capacitorsMALHOTRA SANDRA·Filed 2011·Granted Nov 5, 2013·7 cites·15 claims
- 0271US9178006B2Methods to improve electrical performance of ZrO2 based high-K dielectric materials for DRAM applicationsINTERMOLECULAR INC·Filed 2014·Granted Nov 3, 2015·3 cites·16 claims
- 0353US2025248057A1Method of manufacturing semiconductor device and semiconductor deviceTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 0451US2013069202A1Electrode Treatments for Enhanced DRAM PerformanceINTERMOLECULAR INC·Filed 2012·Application pending·0 cites
- 0551US2013071991A1Electrode Treatments for Enhanced DRAM PerformanceINTERMOLECULAR INC·Filed 2012·Application pending·0 cites
- 0647US2012235276A1Electrode treatments for enhanced dram performanceRUI XIANGXIN·Filed 2011·Application pending·0 cites
- 0742US7491652B2In-line processing for forming a silicon nitride filmELPIDA MEMORY INC·Filed 2006·Granted Feb 17, 2009·0 cites·6 claims
- 0842US2009289327A1Capacitor insulating film and method for forming the same, and capacitor and semiconductor deviceELPIDA MEMORY INC·Filed 2009·Application pending·0 cites
- 0938US11965246B2Deposition method and deposition apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Apr 23, 2024·0 cites·6 claims
- 1038US2013285202A1Semiconductor deviceELPIDA MEMORY INC·Filed 2013·Application pending·0 cites
- 1135US2013337625A1Method for manufacturing semiconductor deviceELPIDA MEMORY INC·Filed 2013·Application pending·0 cites
- 1230US2012181660A1Semiconductor deviceFUJIWARA NAONORI·Filed 2012·Application pending·0 cites
- 1330US2011048769A1Insulating film, method of manufacturing the same, and semiconductor deviceELPIDA MEMORY INC·Filed 2010·Application pending·0 cites
- 1430US2012149193A1Method for manufacturing a semiconductor memory deviceFUJIWARA NAONORI·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →