Inventor · disambiguated record
Shinya Minegishi
Also filed as: MINEGISHI SHINYA
20 granted patents·8 pending applications·28 citations·filing 2012–2020
91Inventor score
Top patents by PatentIndex Score
28 records- 0195US11079676B2Radiation-sensitive composition, pattern-forming method, and metal-containing resin and production method thereofJSR CORP·Filed 2019·Granted Aug 3, 2021·8 cites·23 claims
- 0288US11506976B2Radiation-sensitive composition and resist pattern-forming methodJSR CORP·Filed 2020·Granted Nov 22, 2022·2 cites·20 claims
- 0384US9587065B2Composition for pattern formation, and pattern-forming methodJSR CORP·Filed 2015·Granted Mar 7, 2017·2 cites·19 claims
- 0479US9594303B2Resist pattern-forming method and photoresist compositionJSR CORP·Filed 2014·Granted Mar 14, 2017·4 cites·9 claims
- 0579US8859191B2Pattern-forming method, and composition for forming resist underlayer filmMATSUMURA YUSHI·Filed 2012·Granted Oct 14, 2014·4 cites·7 claims
- 0674US9268225B2Composition, resist pattern-forming method, compound, method for production of compound, and polymerJSR CORP·Filed 2014·Granted Feb 23, 2016·2 cites·19 claims
- 0773US9684235B2Directed self-assembling composition for pattern formation, and pattern-forming methodJSR CORP·Filed 2014·Granted Jun 20, 2017·2 cites·16 claims
- 0871US10308752B2Block copolymerJSR CORP·Filed 2017·Granted Jun 4, 2019·1 cites·14 claims
- 0969US9718950B2Directed self-assembly composition for pattern formation and pattern-forming methodJSR CORP·Filed 2013·Granted Aug 1, 2017·1 cites·18 claims
- 1067US9607849B2Pattern-forming method and resist underlayer film-forming compositionJSR CORP·Filed 2014·Granted Mar 28, 2017·2 cites·14 claims
- 1160US10995173B2Composition and pattern-forming methodJSR CORP·Filed 2019·Granted May 4, 2021·0 cites·20 claims
- 1258US9557644B2Base film-forming composition, and directed self-assembly lithography methodJSR CORP·Filed 2014·Granted Jan 31, 2017·0 cites·16 claims
- 1356US9046769B2Pattern-forming method, and composition for forming resist underlayer filmJSR CORP·Filed 2014·Granted Jun 2, 2015·0 cites·11 claims
- 1452US10146130B2Composition for base, and directed self-assembly lithography methodJSR CORP·Filed 2017·Granted Dec 4, 2018·0 cites·10 claims
- 1552US2017088740A1Base film-forming composition, and directed self-assembly lithography methodJSR CORP·Filed 2016·Application pending·0 cites
- 1648US9046775B2Composition for forming liquid immersion upper layer film, resist pattern-forming method, polymer, and compoundJSR CORP·Filed 2013·Granted Jun 2, 2015·0 cites·10 claims
- 1746US9690192B2Composition for base, and directed self-assembly lithography methodJSR CORP·Filed 2015·Granted Jun 27, 2017·0 cites·15 claims
- 1846US8956807B2Method for forming resist pattern, and composition for forming resist underlayer filmJSR CORP·Filed 2012·Granted Feb 17, 2015·0 cites·8 claims
- 1944US2020356000A9Radiation-sensitive composition and pattern-forming methodJSR CORP·Filed 2019·Application pending·0 cites
- 2044US2019310551A1Radiation-sensitive composition, pattern-forming method and metal oxideJSR CORP·Filed 2019·Application pending·0 cites
- 2144US2015093508A1Composition for pattern formation and pattern-forming methodJSR CORP·Filed 2014·Application pending·0 cites
- 2244US2020004144A1Radiation-sensitive composition and pattern-forming methodJSR CORP·Filed 2019·Application pending·0 cites
- 2342US9599892B2Composition for pattern formation, and pattern-forming methodJSR CORP·Filed 2015·Granted Mar 21, 2017·0 cites·17 claims
- 2442US9534135B2Composition for pattern formation, and pattern-forming methodJSR CORP·Filed 2015·Granted Jan 3, 2017·0 cites·20 claims
- 2540US2015252216A1Pattern-forming method and directed self-assembling compositionJSR CORP·Filed 2015·Application pending·0 cites
- 2637US9487868B2Pattern-forming methodJSR CORP·Filed 2015·Granted Nov 8, 2016·0 cites·13 claims
- 2732US2015253663A1Composition for pattern formation, and pattern-forming methodJSR CORP·Filed 2015·Application pending·0 cites
- 2832US2015253671A1Composition for pattern formation, and pattern-forming methodJSR CORP·Filed 2015·Application pending·0 cites
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