Inventor · disambiguated record
Hans-Joachim Merrem
Also filed as: MERREM HANS J · MERREM HANS-JOACHIM
21 granted patents·333 citations·filing 1983–1994
96Inventor score
Top patents by PatentIndex Score
21 records- 0187US4765844ASolvents for photoresist removalHOECHST AG·Filed 1986·Granted Aug 23, 1988·58 cites·11 claims
- 0282US5338641APositive-working radiation-sensitive mixture and copying material produced therefrom comprising an α,α-bis(sulfonyl) diazo methane as an acid forming compoundHOECHST AG·Filed 1993·Granted Aug 16, 1994·39 cites·25 claims
- 0381US4540650APhotoresists suitable for forming relief structures of highly heat-resistant polymersMERCK PATENT GMBH·Filed 1983·Granted Sep 10, 1985·29 cites·21 claims
- 0478US4576903ADeveloper for positive photoresistsMERCK PATENT GMBH·Filed 1984·Granted Mar 18, 1986·33 cites·11 claims
- 0575US5340682APositive-working radiation-sensitive mixture and copying material produced therefrom comprising an α-carbonyl-α-sulfonyl diazomethane, a water-insoluble binder and an acid cleavable compoundHOECHST AG·Filed 1993·Granted Aug 23, 1994·29 cites·21 claims
- 0672US4927732APositive-working photosensitive composition containing a dye and positive-working photosensitive recording material prepared therefromHOECHST AG·Filed 1988·Granted May 22, 1990·20 cites·21 claims
- 0771US4996301APolyfunctional α-diazo-β-keto esters and their use in light-sensitive compositionsHOECHST AG·Filed 1990·Granted Feb 26, 1991·10 cites·30 claims
- 0861US5326826ARadiation-sensitive polymers containing diazocarbonyl groups and a process for their preparationHOECHST AG·Filed 1992·Granted Jul 5, 1994·16 cites·46 claims
- 0955US5334481APositive diazo quinone photoresist compositions containing antihalation compoundCIBA GEIGY CORP·Filed 1991·Granted Aug 2, 1994·10 cites·12 claims
- 1054US5191069APolyfunctional compounds containing α-diazo-β-keto ester units and sulfonate unitsHOECHST AG·Filed 1991·Granted Mar 2, 1993·5 cites·42 claims
- 1153US5198322APositively operating radiation-sensitive mixture containing a polyfunctional α-diazo-β-keto ester and radiation-sensitive recording material containing this mixtureHOECHST AG·Filed 1990·Granted Mar 30, 1993·10 cites·37 claims
- 1252US4757098AStabilized solutions of radiation-crosslinkable polymer precursors of highly heat-resistant polymersMERCK PATENT GMBH·Filed 1986·Granted Jul 12, 1988·14 cites·17 claims
- 1351US4701300APolyamide ester photoresist formulations of enhanced sensitivityMERCK PATENT GMBH·Filed 1986·Granted Oct 20, 1987·10 cites·16 claims
- 1447US4842901ACoating solution and process for producing glassy layersHOECHST AG·Filed 1988·Granted Jun 27, 1989·14 cites·18 claims
- 1547US4649101AProcess for the production of photoresist relief structures having an overhang character using o-quinone diazide photoresist with overexposureMERCK PATENT GMBH·Filed 1985·Granted Mar 10, 1987·9 cites·10 claims
- 1645US5399463AProcess of photopatterning a substrate with a positive photoresist composition containing a diazoquinone photosensitizerCIBA GEIGY CORP·Filed 1994·Granted Mar 21, 1995·6 cites·4 claims
- 1742US5302488ARadiation-sensitive polymers containing naphthoquinone-2-diazide-4-sulfonyl groups and their use in a positive working recording materialHOECHST AG·Filed 1992·Granted Apr 12, 1994·6 cites·24 claims
- 1842US5256517APositive-working radiation-sensitive mixture and recording material for exposure to UV radiation containing polyfunctional compound having α-β-keto ester units and sulfonate unitsHOECHST AG·Filed 1991·Granted Oct 26, 1993·6 cites·59 claims
- 1936US4539288AProcess for the development of relief structures based on radiation-crosslinked polymeric precursors of polymers which are resistant to high temperatureMERCK PATENT GMBH·Filed 1983·Granted Sep 3, 1985·5 cites·12 claims
- 2034US5066567AImage reversal process utilizing a positive-working photosensitive composition containing a dyeHOECHST AG·Filed 1990·Granted Nov 19, 1991·3 cites·18 claims
- 2129US5358823ARadiation-sensitive composition containing esterification product of (1,2-naphthoquinone-2-diazide)-sulfonic acid with 2,3,4,4'-tetrahydroxybenzophenone and a di- or tri-hydroxybenzophenoneHOECHST AG·Filed 1992·Granted Oct 25, 1994·1 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →