Inventor · disambiguated record
Norio Yokoyama
Also filed as: YOKOYAMA NORIO
9 granted patents·4 pending applications·236 citations·filing 1982–2007
89Inventor score
Top patents by PatentIndex Score
13 records- 0194US6409965B1Sputtering target and its manufacturing methodSONY CORP·Filed 2000·Granted Jun 25, 2002·72 cites·9 claims
- 0285US6086735AContoured sputtering targetPRAXAIR TECHNOLOGY INC·Filed 1998·Granted Jul 11, 2000·47 cites·13 claims
- 0384US5652079ACarrier for dry two-component developer and method of producing the sameRICOH KK·Filed 1995·Granted Jul 29, 1997·37 cites·104 claims
- 0481US6024852ASputtering target and production method thereofSONY CORP·Filed 1997·Granted Feb 15, 2000·53 cites·6 claims
- 0578US6391081B1Metal purification method and metal refinement methodSONY CORP·Filed 2000·Granted May 21, 2002·13 cites·12 claims
- 0660US6740290B2High purity cobalt, method of manufacturing thereof, and high purity cobalt targetsSONY CORP·Filed 2001·Granted May 25, 2004·3 cites·4 claims
- 0746US7279024B2High purity cobalt, method of manufacturing thereof, and high purity cobalt targetsSONY CORP·Filed 2004·Granted Oct 9, 2007·0 cites·5 claims
- 0844US6440572B1Composition, antisticking agents, and thermal transfer recording filmsNATOCO PAINT KK·Filed 1998·Granted Aug 27, 2002·8 cites·4 claims
- 0941US2007082147A1Heat-resistant lubricity imparting coating agent, and thermal transfer recording mediumNATOCO CO LTD·Filed 2005·Application pending·0 cites
- 1041US2003206822A1High purity iron, method of manufacturing thereof, and high purity iron targetsFiled 2003·Application pending·0 cites
- 1138US2002117022A1High purity iron, method of manufacturing thereof, and high purity iron targetsFiled 2001·Application pending·0 cites
- 1236US2009039997A1Metal Terminal, Coil Component, and Method for Holding and Fixing Conductive WireSUMIDA CORP·Filed 2007·Application pending·0 cites
- 1333US4696862AMagnetic recording mediumSONY CORP·Filed 1982·Granted Sep 29, 1987·3 cites·6 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →