Inventor · disambiguated record
Mirko Vukovic
Also filed as: VUKOVIC MIRKO
28 granted patents·6 pending applications·935 citations·filing 1999–2025
96Inventor score
Top patents by PatentIndex Score
34 records- 0197US8252114B2Gas distribution system and method for distributing process gas in a processing systemVUKOVIC MIRKO·Filed 2008·Granted Aug 28, 2012·524 cites·17 claims
- 0295US6417626B1Immersed inductively—coupled plasma sourceTOKYO ELECTRON LTD·Filed 2001·Granted Jul 9, 2002·64 cites·46 claims
- 0395US6287435B1Method and apparatus for ionized physical vapor depositionTOKYO ELECTRON LTD·Filed 1999·Granted Sep 11, 2001·156 cites·12 claims
- 0494US6719886B2Method and apparatus for ionized physical vapor depositionTOKYO ELECTRON LTD·Filed 2001·Granted Apr 13, 2004·54 cites·28 claims
- 0588US6652711B2Inductively-coupled plasma processing systemTOKYO ELECTRON LTD·Filed 2001·Granted Nov 25, 2003·31 cites·29 claims
- 0688US2025391014A1Methods to automatically adjust one or more parameters of a camera system for optimal 3d reconstruction of features formed within/on a semiconductor substrateTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 0788US2025391013A1Methods to automatically adjust one or more parameters of a camera system for optimal 3d reconstruction of features formed within/on a semiconductor substrateTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 0883US7591232B2Internal coil with segmented shield and inductively-coupled plasma source and processing system therewithTOKYO ELECTRON LTD·Filed 2006·Granted Sep 22, 2009·5 cites·17 claims
- 0983US6254745B1Ionized physical vapor deposition method and apparatus with magnetic bucket and concentric plasma and material sourceTOKYO ELECTRON LTD·Filed 1999·Granted Jul 3, 2001·45 cites·16 claims
- 1079US7537671B2Self-calibrating optical emission spectroscopy for plasma monitoringTOKYO ELECTRON LTD·Filed 2006·Granted May 26, 2009·3 cites·12 claims
- 1177US7255774B2Process apparatus and method for improving plasma production of an inductively coupled plasmaTOKYO ELECTRON LTD·Filed 2002·Granted Aug 14, 2007·13 cites·12 claims
- 1276US7691243B2Internal antennae for plasma processing with metal plasmaTOKYO ELECTRON LTD·Filed 2004·Granted Apr 6, 2010·12 cites·8 claims
- 1376US2024419080A1Apparatus and methods for beam processing of substratesTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1475US12462375B2Methods to automatically adjust one or more parameters of a camera system for optimal 3D reconstruction of features formed within/on a semiconductor substrateTOKYO ELECTRON LTD·Filed 2022·Granted Nov 4, 2025·0 cites·16 claims
- 1573US11049700B2Atmospheric plasma processing systems and methods for manufacture of microelectronic workpiecesTOKYO ELECTRON LTD·Filed 2017·Granted Jun 29, 2021·2 cites·6 claims
- 1672US10215704B2Computed tomography using intersecting views of plasma using optical emission spectroscopy during plasma processingTOKYO ELECTRON LTD·Filed 2017·Granted Feb 26, 2019·2 cites·26 claims
- 1770US6771026B2Plasma generation by mode-conversion of RF-electromagnetic wave to electron cyclotron waveTOKYO ELECTRON LTD·Filed 2002·Granted Aug 3, 2004·8 cites·16 claims
- 1869US7959775B2Thermal stress-failure-resistant dielectric windows in vacuum processing systemsTOKYO ELECTRON LTD·Filed 2006·Granted Jun 14, 2011·2 cites·2 claims
- 1967US12105423B2Apparatus and methods for beam processing of substratesTOKYO ELECTRON LTD·Filed 2020·Granted Oct 1, 2024·0 cites·20 claims
- 2065US8048226B2Method and system for improving deposition uniformity in a vapor deposition systemTOKYO ELECTRON LTD·Filed 2007·Granted Nov 1, 2011·2 cites·20 claims
- 2161US6277250B1Dual cathode arrangement for physical vapor deposition of materials onto a round substrate with high aspect ratio featuresTOKYO ELECTRON LTD·Filed 2000·Granted Aug 21, 2001·5 cites·42 claims
- 2259US7315128B2Magnetically enhanced capacitive plasma source for ionized physical vapor depositionTOKYO ELECTRON LTD·Filed 2006·Granted Jan 1, 2008·0 cites·23 claims
- 2356US8568555B2Method and apparatus for reducing substrate temperature variabilitySUZUKI KENJI·Filed 2007·Granted Oct 29, 2013·0 cites·25 claims
- 2456US7084573B2Magnetically enhanced capacitive plasma source for ionized physical vapor depositionTOKYO ELECTRON LTD·Filed 2004·Granted Aug 1, 2006·2 cites·19 claims
- 2555US2009242383A1Apparatus and method for rf grounding of ipvd tableTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 2654US12007689B2Apparatus and method for spin processingTOKYO ELECTRON LTD·Filed 2022·Granted Jun 11, 2024·0 cites·20 claims
- 2754US8435351B2Method and system for measuring a flow rate in a solid precursor delivery systemVUKOVIC MIRKO·Filed 2004·Granted May 7, 2013·2 cites·22 claims
- 2853US2008226842A1Lazy Susan Tool Layout for Light-Activated ALDTOKYO ELECTRON LTD·Filed 2006·Application pending·0 cites
- 2951US7314537B2Method and apparatus for detecting a plasmaTOKYO ELECTRON LTD·Filed 2003·Granted Jan 1, 2008·3 cites·19 claims
- 3050US11883837B2System and method for liquid dispense and coverage controlTOKYO ELECTRON LTD·Filed 2021·Granted Jan 30, 2024·0 cites·9 claims
- 3145US10426001B2Processing system for electromagnetic wave treatment of a substrate at microwave frequenciesTOKYO ELECTRON LTD·Filed 2014·Granted Sep 24, 2019·0 cites·14 claims
- 3244US2007074968A1ICP source for iPVD for uniform plasma in combination high pressure deposition and low pressure etch processVUKOVIC MIRKO·Filed 2005·Application pending·0 cites
- 3338US10522384B2Electromagnetic wave treatment of a substrate at microwave frequencies using a wave resonatorTOKYO ELECTRON LTD·Filed 2016·Granted Dec 31, 2019·0 cites·14 claims
- 3438US10256121B2Heated stage with variable thermal emissivity method and apparatusTOKYO ELECTRON LTD·Filed 2015·Granted Apr 9, 2019·0 cites·21 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →