Inventor · disambiguated record
Shiro Tsukamoto
Also filed as: TSUKAMOTO SHIRO
24 granted patents·2 pending applications·114 citations·filing 1989–2020
94Inventor score
Files withTSUKAMOTO SHIRO10JX NIPPON MINING & METALS CORP6ARAKAWA YASUHIKO1FUJITSU LTD1FUKUSHIMA ATSUSHI1
Top patents by PatentIndex Score
26 records- 0191US8663440B2Titanium target for sputteringTSUKAMOTO SHIRO·Filed 2010·Granted Mar 4, 2014·6 cites·9 claims
- 0281US9068258B2Titanium target for sputteringTSUKAMOTO SHIRO·Filed 2011·Granted Jun 30, 2015·2 cites·13 claims
- 0379US7951275B2Sputtering target and method for finishing surface of such targetJX NIPPON MINING & METALS CORP·Filed 2004·Granted May 31, 2011·18 cites·15 claims
- 0476US7122848B2Substrate bonded transition metal catalyst and method for preparation thereofNAT INST FOR MATERIALS SCIENCE·Filed 2005·Granted Oct 17, 2006·5 cites·8 claims
- 0572US5062140AInduction speakerSONY CORP·Filed 1989·Granted Oct 29, 1991·51 cites·26 claims
- 0671US10006117B2Sputtering target-backing plate assembly and method for producing sameTSUKAMOTO SHIRO·Filed 2011·Granted Jun 26, 2018·2 cites·9 claims
- 0771US9536715B2Recycling method for tantalum coil for sputtering and tantalum coil obtained by the recycling methodTSUKAMOTO SHIRO·Filed 2012·Granted Jan 3, 2017·2 cites·11 claims
- 0869US10167547B2Gadolinium sputtering target and production method of said targetTSUKAMOTO SHIRO·Filed 2010·Granted Jan 1, 2019·2 cites·6 claims
- 0969US9371578B2Tantalum coil for sputtering and method for processing the coilTSUKAMOTO SHIRO·Filed 2011·Granted Jun 21, 2016·2 cites·4 claims
- 1069US8728255B2Pot-shaped copper sputtering target and manufacturing method thereofFUKUSHIMA ATSUSHI·Filed 2006·Granted May 20, 2014·3 cites·15 claims
- 1165US9328411B2Ytterbium sputtering target and method of producing said targetTSUKAMOTO SHIRO·Filed 2009·Granted May 3, 2016·0 cites·13 claims
- 1265US8183073B2Method of manufacturing a semiconductor device with quantum dots formed by self-assembled growthARAKAWA YASUHIKO·Filed 2010·Granted May 22, 2012·2 cites·14 claims
- 1365USD318287SPortable electronic calculatorSEKISUI CHEMICAL CO LTD·Filed 1989·Granted Jul 16, 1991·10 cites·1 claims
- 1463US10431438B2Titanium target for sputtering and manufacturing method thereofJX NIPPON MINING & METALS CORP·Filed 2014·Granted Oct 1, 2019·0 cites·10 claims
- 1561US9530628B2Titanium target for sputteringMAKINO NOBUHITO·Filed 2012·Granted Dec 27, 2016·1 cites·16 claims
- 1657US12129529B2Oxidation-resistant metallic tinJX NIPPON MINING & METALS CORP·Filed 2020·Granted Oct 29, 2024·0 cites·8 claims
- 1757US6383286B1Method of making semiconductor super-atom and aggregate thereofJP NAT RES INST FOR METALS·Filed 2000·Granted May 7, 2002·6 cites·8 claims
- 1854US9347130B2Lanthanum target for sputteringTSUKAMOTO SHIRO·Filed 2010·Granted May 24, 2016·0 cites·4 claims
- 1954US7892871B2Method of manufacturing semiconductor device with quantum dots formed by self-assembled growthFUJITSU LTD·Filed 2007·Granted Feb 22, 2011·0 cites·9 claims
- 2053US9711336B2Backing plate-integrated metal sputtering target and method of producing sameJX NIPPON MINING & METALS CORP·Filed 2014·Granted Jul 18, 2017·0 cites·10 claims
- 2153US2009090621A1Erbium Sputtering Target and Manufacturing MethodNIPPON MINING CO·Filed 2008·Application pending·0 cites
- 2250US10781024B2Method for vacuum packing high-purity tin and vacuum-packed high purity tinJX NIPPON MINING & METALS CORP·Filed 2017·Granted Sep 22, 2020·0 cites·12 claims
- 2350US9666418B2Titanium target for sputteringTSUKAMOTO SHIRO·Filed 2012·Granted May 30, 2017·0 cites·17 claims
- 2447US9382612B2Lanthanum target for sputteringTSUKAMOTO SHIRO·Filed 2010·Granted Jul 5, 2016·0 cites·9 claims
- 2546US2020180840A1Vacuum-packaged product of high-purity metal and method for producing vacuum-packaged productJX NIPPON MINING & METALS CORP·Filed 2018·Application pending·0 cites
- 2630US6074485ACrystal growth observing apparatus using a scanning tunneling microscopeNAT RES INST METALS·Filed 1998·Granted Jun 13, 2000·2 cites·3 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →