Inventor · disambiguated record
Ivelin Angelov
Also filed as: ANGELOV IVELIN · ANGELOV IVELIN A
17 granted patents·7 pending applications·130 citations·filing 2004–2022
93Inventor score
Top patents by PatentIndex Score
24 records- 0194US8371567B2Pedestal coversNOVELLUS SYSTEMS INC·Filed 2011·Granted Feb 12, 2013·29 cites·26 claims
- 0293US10699878B2Chamber member of a plasma source and pedestal with radially outward positioned lift pins for translation of a substrate c-ringLAM RES CORP·Filed 2017·Granted Jun 30, 2020·12 cites·27 claims
- 0393US9812349B2Control of the incidence angle of an ion beam on a substrateLAM RES CORP·Filed 2015·Granted Nov 7, 2017·8 cites·6 claims
- 0491US10651015B2Variable depth edge ring for etch uniformity controlLAM RES CORP·Filed 2017·Granted May 12, 2020·7 cites·10 claims
- 0591US8851463B2Pedestal coversANGELOV IVELIN·Filed 2013·Granted Oct 7, 2014·19 cites·33 claims
- 0689US10825659B2Substrate processing chamber including multiple gas injection points and dual injectorLAM RES CORP·Filed 2017·Granted Nov 3, 2020·8 cites·13 claims
- 0786US10147588B2System and method for increasing electron density levels in a plasma of a substrate processing systemLAM RES CORP·Filed 2017·Granted Dec 4, 2018·5 cites·19 claims
- 0883US10727089B2Systems and methods for selectively etching filmLAM RES CORP·Filed 2017·Granted Jul 28, 2020·4 cites·15 claims
- 0982US9911620B2Method for achieving ultra-high selectivity while etching silicon nitrideLAM RES CORP·Filed 2015·Granted Mar 6, 2018·3 cites·20 claims
- 1081US11469079B2Ultrahigh selective nitride etch to form FinFET devicesLAM RES CORP·Filed 2017·Granted Oct 11, 2022·3 cites·13 claims
- 1175US9679749B2Gas distribution device with actively cooled gridLAM RES CORP·Filed 2014·Granted Jun 13, 2017·4 cites·35 claims
- 1267US11342163B2Variable depth edge ring for etch uniformity controlLAM RES CORP·Filed 2020·Granted May 24, 2022·0 cites·10 claims
- 1367US10438833B2Wafer lift ring system for wafer transferLAM RES CORP·Filed 2017·Granted Oct 8, 2019·1 cites·12 claims
- 1467USD641829SPlasma reactor showerhead face plate having concentric ridge patternNOVELLUS SYSTEMS INC·Filed 2010·Granted Jul 19, 2011·16 cites·1 claims
- 1566US2023084901A1Ultrahigh selective nitride etch to form finfet devicesLAM RES CORP·Filed 2022·Application pending·0 cites
- 1661US7731798B2Heated chuck for laser thermal processingULTRATECH INC·Filed 2004·Granted Jun 8, 2010·8 cites·36 claims
- 1751US2017330788A1Control Of The Incidence Angle Of An Ion Beam On A SubstrateLAM RES CORP·Filed 2017·Application pending·0 cites
- 1851US2018158692A1Apparatus for achieving ultra-high selectivity while etching silicon nitrideLAM RES CORP·Filed 2018·Application pending·0 cites
- 1945US2012108072A1Showerhead configurations for plasma reactorsANGELOV IVELIN A·Filed 2010·Application pending·0 cites
- 2044US2016181116A1Selective nitride etchLAM RES CORP·Filed 2014·Application pending·0 cites
- 2143US2010120335A1Partial Contact Wafer Retaining Ring ApparatusNOVELLUS SYSTEMS INC·Filed 2008·Application pending·0 cites
- 2239US7326877B2Laser thermal processing chuck with a thermal compensating heater moduleULTRATECH INC·Filed 2004·Granted Feb 5, 2008·0 cites·20 claims
- 2336USD671901SPedestal coverANGELOV IVELIN·Filed 2011·Granted Dec 4, 2012·3 cites·1 claims
- 2434US2017278679A1Method and apparatus for controlling process within wafer uniformityLAM RES CORP·Filed 2017·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →