Inventor · disambiguated record
Norifumi Kimura
Also filed as: KIMURA NORIFUMI
8 granted patents·4 pending applications·856 citations·filing 1998–2014
89Inventor score
Top patents by PatentIndex Score
12 records- 0198US7648895B2Vertical CVD apparatus for forming silicon-germanium filmTOKYO ELECTRON LTD·Filed 2008·Granted Jan 19, 2010·337 cites·14 claims
- 0297USD404370SCap for use in a semiconductor wafer heat processing apparatusTOKYO ELECTRON LTD·Filed 1998·Granted Jan 19, 1999·476 cites·1 claims
- 0389US7494943B2Method for using film formation apparatusTOKYO ELECTRON LTD·Filed 2006·Granted Feb 24, 2009·10 cites·20 claims
- 0474US7597553B2Orthodontic bracketKIMURA NORIFUMI·Filed 2006·Granted Oct 6, 2009·8 cites·5 claims
- 0567US7938080B2Method for using film formation apparatusTOKYO ELECTRON LTD·Filed 2008·Granted May 10, 2011·8 cites·5 claims
- 0660US7273818B2Film formation method and apparatus for semiconductor processTOKYO ELECTRON LTD·Filed 2004·Granted Sep 25, 2007·7 cites·16 claims
- 0749US2005181586A1Vertical CVD apparatus for forming silicon-germanium filmFiled 2004·Application pending·0 cites
- 0846USD404374SFin for use in a semiconductor wafer heat processing apparatusTOKYO ELECTRON LTD·Filed 1998·Granted Jan 19, 1999·6 cites·1 claims
- 0941US2014295675A1Silicon oxide film forming method and silicon oxide film forming apparatusTOKYO ELECTRONIC LTD·Filed 2014·Application pending·0 cites
- 1040US2006021570A1Reduction in size of hemispherical grains of hemispherical grained filmHASEBE KAZUHIDE·Filed 2005·Application pending·0 cites
- 1139USD404373SFin for use in a semiconductor wafer heat processing apparatusTOKYO ELECTRON LTD·Filed 1998·Granted Jan 19, 1999·4 cites·1 claims
- 1234US2011287629A1Silicon film formation method and silicon film formation apparatusKAKIMOTO AKINOBU·Filed 2011·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →