Inventor · disambiguated record
Hitoshi Murayama
Also filed as: MURAYAMA HITOSHI
29 granted patents·2 pending applications·418 citations·filing 1992–2008
97Inventor score
Files withCANON KK30
Top patents by PatentIndex Score
31 records- 0194US6861373B2Vacuum processing method and semiconductor device manufacturing method in which high-frequency powers having mutually different frequencies are applied to at least one electrodeCANON KK·Filed 2001·Granted Mar 1, 2005·52 cites·21 claims
- 0294US6702898B2Deposited film forming apparatusCANON KK·Filed 2002·Granted Mar 9, 2004·43 cites·6 claims
- 0388US5817181AProcess for forming deposited film for light-receiving member, light-received member produced by the process deposited film forming apparatus, and method for cleaning deposited film forming apparatusCANON KK·Filed 1995·Granted Oct 6, 1998·39 cites·14 claims
- 0486US6250251B1Vacuum processing apparatus and vacuum processing methodCANON KK·Filed 1999·Granted Jun 26, 2001·49 cites·27 claims
- 0584US5455138AProcess for forming deposited film for light-receiving member, light-receiving member produced by the process, deposited film forming apparatus, and method for cleaning deposited film forming apparatusCANON KK·Filed 1993·Granted Oct 3, 1995·46 cites·105 claims
- 0681US5392098AElectrophotographic apparatus with amorphous silicon-carbon photosensitive member driven relative to light sourceCANON KK·Filed 1992·Granted Feb 21, 1995·27 cites·6 claims
- 0774US7051671B2Vacuum processing apparatus in which high frequency powers having mutually different frequencies are used to generate plasma for processing an articleCANON KK·Filed 2004·Granted May 30, 2006·9 cites·11 claims
- 0870US6696108B2Vacuum processing methodCANON KK·Filed 2001·Granted Feb 24, 2004·11 cites·14 claims
- 0963US6443191B1Vacuum processing methodsCANON KK·Filed 2001·Granted Sep 3, 2002·9 cites·20 claims
- 1062US6350497B1Plasma processing methodCANON KK·Filed 2000·Granted Feb 26, 2002·8 cites·71 claims
- 1162US6165274APlasma processing apparatus and methodCANON KK·Filed 1998·Granted Dec 26, 2000·15 cites·21 claims
- 1261US7550180B2Plasma treatment methodCANON KK·Filed 2008·Granted Jun 23, 2009·0 cites·6 claims
- 1359US6946167B2Deposited film forming apparatus and deposited film forming methodCANON KK·Filed 2003·Granted Sep 20, 2005·2 cites·3 claims
- 1459US6849123B2Plasma processing method and method for manufacturing semiconductor deviceCANON KK·Filed 2002·Granted Feb 1, 2005·7 cites·19 claims
- 1558US6321759B1Method for cleaning a substrateCANON KK·Filed 1998·Granted Nov 27, 2001·15 cites·6 claims
- 1656US6435130B1Plasma CVD apparatus and plasma processing methodCANON KK·Filed 1997·Granted Aug 20, 2002·18 cites·18 claims
- 1754US5631727AImage forming apparatus having discharging means using light source actuated prior to latent image formationCANON KK·Filed 1994·Granted May 20, 1997·9 cites·12 claims
- 1852US6649020B1Plasma processing apparatusCANON KK·Filed 2001·Granted Nov 18, 2003·3 cites·7 claims
- 1951US6155201APlasma processing apparatus and plasma processing methodCANON KK·Filed 1998·Granted Dec 5, 2000·13 cites·61 claims
- 2050US5512510AMethod of manufacturing amorphous silicon electrophotographic photosensitive memberCANON KK·Filed 1994·Granted Apr 30, 1996·11 cites·7 claims
- 2149US6486045B2Apparatus and method for forming deposited filmCANON KK·Filed 2001·Granted Nov 26, 2002·1 cites·8 claims
- 2248US6300225B1Plasma processing methodCANON KK·Filed 1999·Granted Oct 9, 2001·11 cites·20 claims
- 2345US2004112864A1Plasma treatment method and plasma treatment apparatusCANON KK·Filed 2003·Application pending·0 cites
- 2440US6413592B1Apparatus for forming a deposited film by plasma chemical vapor depositionCANON KK·Filed 2000·Granted Jul 2, 2002·0 cites·17 claims
- 2540US6347601B1Film forming apparatusCANON KK·Filed 1998·Granted Feb 19, 2002·3 cites·9 claims
- 2638US6761128B2Plasma treatment apparatusCANON KK·Filed 2001·Granted Jul 13, 2004·0 cites·3 claims
- 2738US6148763ADeposited film forming apparatusCANON KK·Filed 1998·Granted Nov 21, 2000·6 cites·10 claims
- 2838US2003196601A1Plasma processing method and plasma processing apparatusFiled 2002·Application pending·0 cites
- 2937US6336423B1Apparatus for forming a deposited film by plasma chemical vapor depositionCANON KK·Filed 1998·Granted Jan 8, 2002·5 cites·15 claims
- 3036US5516611ALight-receiving member and methods of producing light-receiving memberCANON KK·Filed 1994·Granted May 14, 1996·5 cites·13 claims
- 3131US5766811AMethod of manufacturing amorphous silicon electrophotographic photosensitive memberCANON KK·Filed 1996·Granted Jun 16, 1998·1 cites·7 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →