Inventor · disambiguated record
Seongsue Kim
Also filed as: KIM SEONGSUE
12 granted patents·1 pending application·20 citations·filing 2013–2023
86Inventor score
Top patents by PatentIndex Score
13 records- 0192US11635371B2Apparatus and method for measuring phase of extreme ultraviolet (EUV) mask and method of fabricating EUV mask including the methodSAMSUNG ELECTRONICS CO LTD·Filed 2020·Granted Apr 25, 2023·3 cites·16 claims
- 0283US9466490B2Beam shapers, annealing systems employing the same, methods of heat treating substrates and methods of fabricating semiconductor devicesSAMSUNG ELECTRONICS CO LTD·Filed 2015·Granted Oct 11, 2016·4 cites·20 claims
- 0381US10401602B2EUV light generator including collecting mirror having drip holeSAMSUNG ELECTRONICS CO LTD·Filed 2016·Granted Sep 3, 2019·5 cites·19 claims
- 0480US10719008B2Phase-shift mask for extreme ultraviolet lithographySAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Jul 21, 2020·2 cites·20 claims
- 0580US9087698B2Beam shapers, annealing systems employing the same, methods of heat treating substrates and methods of fabricating semiconductor devicesKIM SANGHYUN·Filed 2013·Granted Jul 21, 2015·5 cites·28 claims
- 0677US11852583B2Apparatus and method for measuring phase of extreme ultraviolet (EUV) mask and method of fabricating EUV mask including the methodSAMSUNG ELECTRONICS CO LTD·Filed 2023·Granted Dec 26, 2023·0 cites·12 claims
- 0772US11774846B2Phase shift masks for extreme ultraviolet lithographySAMSUNG ELECTRONICS CO LTD·Filed 2022·Granted Oct 3, 2023·0 cites·13 claims
- 0871US10126642B2Reflective photomask, method of fabricating the same, and exposure apparatus using the reflective photomaskSAMSUNG ELECTRONICS CO LTD·Filed 2016·Granted Nov 13, 2018·1 cites·16 claims
- 0967US11487197B2Phase shift masks for extreme ultraviolet lithographySAMSUNG ELECTRONICS CO LTD·Filed 2020·Granted Nov 1, 2022·0 cites·20 claims
- 1066US11372323B2Phase-shift mask for extreme ultraviolet lithographySAMSUNG ELECTRONICS CO LTD·Filed 2020·Granted Jun 28, 2022·0 cites·19 claims
- 1156US12099293B2Phase shift mask for extreme ultraviolet lithography and a method of manufacturing a semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2021·Granted Sep 24, 2024·0 cites·9 claims
- 1244US9996001B2Reticle and exposure apparatus including the sameSAMSUNG ELECTRONICS CO LTD·Filed 2016·Granted Jun 12, 2018·0 cites·20 claims
- 1342US2014220481A1Photomasks and methods of fabricating semiconductor devices using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2013·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →