Inventor · disambiguated record
Yuichi Iwasaki
Also filed as: IWASAKI YUICHI
22 granted patents·6 pending applications·283 citations·filing 1998–2024
94Inventor score
Top patents by PatentIndex Score
28 records- 0192US6818911B2Array structure and method of manufacturing the same, charged particle beam exposure apparatus, and device manufacturing methodCANON KK·Filed 2003·Granted Nov 16, 2004·46 cites·29 claims
- 0292US6514674B1Method of forming an optical elementCANON KK·Filed 2000·Granted Feb 4, 2003·59 cites·18 claims
- 0391US6953938B2Deflector, method of manufacturing deflector, and charged particle beam exposure apparatusHITACHI LTD·Filed 2003·Granted Oct 11, 2005·35 cites·5 claims
- 0491US6534242B2Multiple exposure device formationCANON KK·Filed 2001·Granted Mar 18, 2003·41 cites·104 claims
- 0589US7018783B2Fine structure and devices employing itCANON KK·Filed 2002·Granted Mar 28, 2006·21 cites·34 claims
- 0687US7276707B2Deflector, method of manufacturing deflector, and charged particle beam exposure apparatusHITACHI LTD·Filed 2005·Granted Oct 2, 2007·9 cites·21 claims
- 0784US6475704B1Method for forming fine structureCANON KK·Filed 1998·Granted Nov 5, 2002·48 cites·36 claims
- 0882US10476495B2Drive deviceNISSAN MOTOR·Filed 2016·Granted Nov 12, 2019·5 cites·9 claims
- 0980US11535039B2Ejection-material ejection apparatus and imprinting apparatusCANON KK·Filed 2018·Granted Dec 27, 2022·1 cites·20 claims
- 1075US6930834B2Method of manufacturing diffractive optical elementCANON KK·Filed 2001·Granted Aug 16, 2005·14 cites·9 claims
- 1172US10987840B2Ejection-material ejection apparatus and imprinting apparatusCANON KK·Filed 2019·Granted Apr 27, 2021·1 cites·10 claims
- 1267US8035796B2Immersion exposure apparatus and device manufacturing methodCANON KK·Filed 2008·Granted Oct 11, 2011·2 cites·5 claims
- 1363US12441122B2Liquid discharge apparatus and imprint apparatusCANON KK·Filed 2023·Granted Oct 14, 2025·0 cites·30 claims
- 1463US2024393678A1Removing method, removal apparatus, imprint apparatus, replica manufacturing apparatus, and article manufacturing methodCANON KK·Filed 2024·Application pending·0 cites
- 1558US2024269903A1Liquid material, mold, forming method, forming apparatus, imprint apparatus, planarization apparatus, and article manufacturing methodCANON KK·Filed 2024·Application pending·0 cites
- 1655US11520227B2Ejection material filling device, pressure regulation device, and ejection material filling methodCANON KK·Filed 2020·Granted Dec 6, 2022·0 cites·21 claims
- 1754US11745409B2Storage device, ejection-material ejection device, and imprint apparatusCANON KK·Filed 2020·Granted Sep 5, 2023·0 cites·16 claims
- 1854US8484910B2Active dynamic vibration absorberSHIMODA IKUO·Filed 2010·Granted Jul 16, 2013·1 cites·13 claims
- 1950US11881526B2Semiconductor device and method for manufacturing sameNISSAN MOTOR·Filed 2020·Granted Jan 23, 2024·0 cites·14 claims
- 2048US11146163B2Switching device and method for controlling switching deviceNISSAN MOTOR·Filed 2018·Granted Oct 12, 2021·0 cites·13 claims
- 2148US7679717B2Exposure apparatusCANON KK·Filed 2006·Granted Mar 16, 2010·0 cites·6 claims
- 2247US2009273766A1Apparatus and method for exposure and method of manufacturing deviceCANON KK·Filed 2009·Application pending·0 cites
- 2345US11973108B2Semiconductor device and manufacturing method thereofNISSAN MOTOR·Filed 2020·Granted Apr 30, 2024·0 cites·8 claims
- 2445US2013011734A1Copper foil for negative electrode current collector of secondary batteryJX NIPPON MINING & METALS CORP·Filed 2011·Application pending·0 cites
- 2544US9606460B2Lithography apparatus, and method of manufacturing articleCANON KK·Filed 2015·Granted Mar 28, 2017·0 cites·15 claims
- 2644US8363205B2Exposure apparatusCANON KABISHIKI KAISHA·Filed 2007·Granted Jan 29, 2013·0 cites·5 claims
- 2738US2021183726A1Semiconductor deviceNISSAN MOTOR·Filed 2017·Application pending·0 cites
- 2837US2017140922A1Generating method, imprinting method, imprint apparatus, program, and method of manufacturing articleCANON KK·Filed 2016·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →