Inventor · disambiguated record
Takehisa Yahiro
Also filed as: YAHIRO TAKEHISA
10 granted patents·2 pending applications·116 citations·filing 1998–2017
88Inventor score
Top patents by PatentIndex Score
12 records- 0179US6204509B1Projection-microlithography apparatus, masks, and related methods incorporating reticle-distortion measurement and correctionNIKON CORP·Filed 1998·Granted Mar 20, 2001·43 cites·44 claims
- 0275US6635402B2Devices for measuring and adjusting illumination uniformity obtained from a charged-particle illumination-optical systemNIKON CORP·Filed 2002·Granted Oct 21, 2003·11 cites·10 claims
- 0373US6521392B2Methods for measuring and adjusting illumination uniformity obtained from a charged-particle illumination-optical systemNIKON CORP·Filed 2000·Granted Feb 18, 2003·10 cites·16 claims
- 0472US6277532B1Charged-particle-beam microlithographic methods for correction of reticle distortionsNIKON CORP·Filed 1999·Granted Aug 21, 2001·35 cites·11 claims
- 0566US6831282B2Methods and devices for evaluating beam blur in a charged-particle-beam microlithography apparatusNIKON CORP·Filed 2001·Granted Dec 14, 2004·7 cites·23 claims
- 0658US6861187B2Methods and devices for evaluating imaging characteristics of a charged-particle-beam microlithography systemNIKON CORP·Filed 2002·Granted Mar 1, 2005·4 cites·20 claims
- 0751US6531786B1Durable reference marks for use in charged-particle-beam (CPB) microlithography, and CPB microlithography apparatus and methods comprising sameNIKON CORP·Filed 2000·Granted Mar 11, 2003·3 cites·6 claims
- 0841US2003075690A1Methods and devices for evaluating beam blur in subfields projection-exposed by a charged-particle-beam microlithography apparatusNIKON CORP·Filed 2002·Application pending·0 cites
- 0939US11276546B2Charged particle beam optical system, exposure apparatus, exposure method and device manufacturing methodNIKON CORP·Filed 2017·Granted Mar 15, 2022·0 cites·17 claims
- 1039US7019313B2Methods and devices for evaluating beam blur in subfields projection-exposed by a charged-particle-beam microlithography apparatusYAHIRO TAKEHISA·Filed 2004·Granted Mar 28, 2006·0 cites·41 claims
- 1136US6218058B1Charged particle beam transfer maskNIKON CORP·Filed 1999·Granted Apr 17, 2001·3 cites·6 claims
- 1228US2003043358A1Methods for determining focus and astigmatism in charged-particle-beam microlithographyNIKON CORP·Filed 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →